Multi-charged-particle beam writing apparatus and multi-charged-particle beam writing method

A multi-charged-particle beam writing apparatus, comprising:

• an emitter emitting a charged particle beam;
• a first shaping aperture array substrate having a plurality of first apertures and forming first multiple beams by passing a part of the charged particle beam through the first apertures, respectively, each of the first apertures having a first edge;
• a second shaping aperture array substrate having second apertures formed at positions corresponding to the respective first apertures and forming second multiple beams by passing at least a part of each of the first multiple beams through the corresponding second apertures, respectively, each of the second apertures having a second edge;
• a blanking aperture array having third apertures formed at positions corresponding to the respective second apertures and including blankers disposed in the respective third apertures to perform blanking deflection on the respective beams of the corresponding second multiple beams;
• a movable mechanism moving at least one of the first shaping aperture array substrate and the second shaping aperture array substrate;
• a controller controlling the movable mechanism;
• a transmission current measurement circuit measuring a current of the second multiple beams transmitting respectively through the blanking aperture array;
• and
• an origin map storage memory storing an origin map indicating a relative positional relationship between the first shaping aperture array substrate and the second shaping aperture array substrate, the origin map being created on the basis of a result of the measurement,
• wherein each of the second multiple beams is shaped by both of the first edge and the second edge.