Gas cluster ion beam apparatus and analyzing apparatus

An analyzing apparatus comprising:

• a sample chamber configured to receive a sample;
• a measurement apparatus configured to measure a physical quantity of a surface of the sample;
• a gas cluster ion beam apparatus configured to emit a gas cluster ion beam on the sample, the gas cluster ion beam apparatus including:
• an ionization chamber configured so that a gas cluster formed by ejecting source gas from an ejection hole of a nozzle supported by a nozzle support travels;
• an ionization filament configured to emit thermoelectrons when heated and to irradiate the gas cluster travelling in the ionization chamber with the thermoelectrons so as to generate gas cluster ions;
• a cooling body;
• the nozzle support and the ionization chamber being in contact with the cooling body, and separated from each other;
• a cooling device configured to cool the cooling body to a predetermined temperature;
• a gas pipe configured to supply the source gas to the nozzle;
• a gas heating device configured to heat the source gas;
• and
• a main controller configured to control the heat generation of the gas heating device,
• wherein, while a temperature of the source gas ejected from the nozzle is controlled by the main controller, the gas cluster ion beam containing the generated gas cluster ions is ejected outside the ionization chamber and is irradiated on the sample arranged in the sample chamber.