Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method

A charged particle beam writing apparatus comprising:

• an emission unit configured to emit a charged particle beam;
• an electron lens configured to converge the charged particle beam;
• a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, configured to deflect the charged particle beam in a case of performing a blanking control of switching between beam-on and beam-off;
• a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, configured to block the charged particle beam having been deflected to be in a beam-off state;
• a first amplifier configured to apply a first voltage for beam-on and a second voltage for beam-off to the blanking deflector;
• and
• a second amplifier, in addition to the first amplifier, connected in parallel with the first amplifier to the blanking deflector, configured to apply in a blanking deflection adjustment, to the blanking deflector to which the first amplifier applies the first voltage, a third voltage for deflecting the charged particle beam to be in an extent of deflection not to trigger a beam-off state from a beam-on state by the blanking deflector during the first voltage being applied from the first amplifier to the blanking deflector, and the extent of the deflection based on the third voltage being larger than an extent of deflection based on the first voltage generated during a beam-on period of the blanking deflector.