Extreme ultraviolet chamber apparatus, extreme ultraviolet light generation system, and method for manufacturing electronic device

An extreme ultraviolet chamber apparatus comprising:

• a chamber;
• an EUV condensing mirror arranged in the chamber;
• a first nozzle arranged in an outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a first direction along a reflective surface of the EUV condensing mirror;
• a second nozzle arranged in the outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a second direction away from the EUV condensing mirror;
• an exhaust port arranged in the chamber;
• and
• a third nozzle arranged between the first nozzle and the second nozzle, wherein
• the EUV condensing mirror has a spheroidal reflective surface, and
• the first, second, and third nozzles are arranged in a space of 30 mm or less in a direction of a line passing through a first focal point and a second focal point of the spheroidal reflective surface.

A method for manufacturing an electronic device comprising:

• irradiating a target with a pulse laser beam to generate extreme ultraviolet light in an extreme ultraviolet light generation system including a chamber, a target supply unit configured to output the target toward a predetermined region in the chamber, a laser device configured to irradiate the target with the pulse laser beam to turn the target into plasma, an EUV condensing mirror arranged in the chamber, a first nozzle arranged in an outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a first direction along a reflective surface of the EUV condensing mirror, a second nozzle arranged in the outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a second direction away from the EUV condensing mirror, an exhaust port arranged in the chamber, and a third nozzle arranged between the first nozzle and the second nozzle, the EUV condensing mirror having a spheroidal reflective surface, the third nozzle being arranged in the outer peripheral portion of the EUV condensing mirror and feeding a gas in a third direction, the third direction being along a plane perpendicular to a line passing through a first focal point and a second focal point of the spheroidal reflective surface and being toward the line;
• outputting the extreme ultraviolet light to an exposure device;
• and
• exposing a photosensitive substrate to the extreme ultraviolet light in the exposure device to manufacture an electronic device.