Pattern drawing device, pattern drawing method, and method for manufacturing device

A pattern drawing method for drawing a pattern on a substrate, by projecting a beam from a light source apparatus onto the substrate and scanning in a main scanning direction while performing intensity modulation of the beam according to pattern information, the pattern drawing method comprising:

• deflecting the beam from the light source apparatus to scan with the beam in the main scanning direction;
• projecting the deflected beam onto the substrate in a telecentric state;
• intensity-modulating the beam according to the pattern information, such that at least a portion of a second pattern to be newly drawn is drawn overlapping with at least a portion of a first pattern formed in advance of a specified material on the substrate;
• photoelectrically detecting reflected light of the beam projected onto the substrate;
• and
• while the second pattern is being drawn on the substrate, measuring a relative positional relationship between the first pattern and the second pattern, based on a photoelectrically detected detection signal.

A device manufacturing method for manufacturing an electronic device by drawing a pattern on a substrate, by projecting a beam from a light source apparatus onto the substrate and scanning in a main scanning direction while performing intensity modulation of the beam according to pattern information, the device manufacturing method comprising:

• deflecting the beam from the light source apparatus to scan with the beam in the main scanning direction;
• projecting the deflected beam onto the substrate in a telecentric state;
• intensity-modulating the beam according to the pattern information, such that at least a portion of a second pattern to be newly drawn is drawn overlapping with at least a portion of a first pattern formed in advance of a specified material on the substrate;
• and
• while the second pattern is being drawn on the substrate, measuring at least one of position information of the first pattern, shape information, and information of a relative positional relationship between the first pattern and the second pattern, based on a detection signal obtained by photoelectrically detecting reflected light of the beam projected onto the substrate.

A pattern drawing apparatus that draws a pattern on a substrate, by projecting a beam from a first light source apparatus onto the substrate and performing relative scanning while performing intensity modulation of the beam according to pattern information, the pattern drawing apparatus comprising:

• a second light source apparatus configured to emit measurement light having a wavelength differing from that of the beam from the first light source apparatus;
• a drawing unit including a beam scanning section that has a deflecting member configured to deflect the beam and the measurement light to scan the substrate with the beam and the measurement light, and a reflected light detecting section configured to photoelectrically detect, via the deflecting member of the beam scanning section, reflected light emitted when the measurement light is projected onto the substrate;
• and
• a measuring section configured to measure information relating to at least one of a position and a shape on the substrate of a first pattern formed in advance of a specified material on the substrate, based on a detection signal output from the reflected light detecting section.

A pattern drawing method for drawing a pattern on a substrate, by projecting a beam from a first light source apparatus onto the substrate and performing relative scanning while performing intensity modulation of the beam according to pattern information, the pattern drawing method comprising:

• deflecting the beam and measurement light having a wavelength differing from that of the beam, to relatively scan the substrate with the beam and the measurement light;
• projecting the deflected beam and measurement light onto the substrate in a telecentric state;
• photoelectrically detecting reflected light of the measurement light projected onto the substrate;
• and
• measuring at least one of a position and a shape on the substrate of a first pattern formed in advance of a specified material on the substrate, based on a photoelectrically detected detection signal.

A pattern drawing apparatus that draws a new pattern on a substrate by projecting onto the substrate a drawing beam intensity-modulated according to pattern information, the pattern drawing apparatus comprising:

• a beam scanning section that scans the substrate with the drawing beam, using a deflecting member that deflects the drawing beam;
• a first light detecting section that photoelectrically detects reflected light emitted when the drawing beam is projected in at least a portion of the first pattern formed in advance of a specified material on the substrate;
• a measurement beam transmission system that guides a measurement beam having a wavelength differing from that of the drawing beam to the deflecting section, such that the substrate is scanned with the measurement beam via the beam scanning section;
• a second light detecting section that photoelectrically detects reflected light emitted when the measurement beam is projected in at least a portion of the first pattern on the substrate;
• and
• a control section that controls a position of the new pattern to be drawn on the substrate by the drawing beam, based on a signal output from at least one of the first light detecting section and the second light detecting section.