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US 11,143,690 B2Granted
Testing structure and testing method
AssigneeNanya Technology Corporation
InventorsHsueh-Han Lu, Jui-Hsiu Jao
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Abstract
A testing structure is disclosed. The testing structure includes a first layer, a second layer, and a third layer. The first layer includes a first pattern. The third layer includes a second pattern. The first layer, the second layer, and the third layer overlap each other. The second layer is connected to a CBCM (charged based capacitance measurement) testing circuit.
Claims8
A testing structure, comprising:
- a first layer, comprising a first pattern;
- a second layer;
- and
- a third layer, comprising a second pattern;
- wherein the first layer, the second layer, and the third layer overlap each other,
- wherein the second layer is connected to a CBCM (charged based capacitance measurement) testing circuit;
- wherein a parasitic capacitance of the second layer is tested by the CBCM testing circuit, and at least one circuit property of the first layer and at least one circuit property of the third layer are tested by another testing circuit.
4 more elements
A testing method, suitable for a testing structure including a first layer, a second layer, and a third layer, wherein the testing method comprises:
- testing the second layer by a CBCM (charged based capacitance measurement) testing circuit;
- and
- testing the first layer and the third layer by another circuit;
- wherein the first layer comprises a first pattern and the third layer comprises a second pattern, wherein the first layer, the second layer, and the third layer overlap each other;
- wherein a parasitic capacitance of the second layer is tested by the CBCM testing circuit, and at least one circuit property of the first layer and at least one circuit property of the third layer are tested by the another testing circuit.
2 more elements
Dependencies are inferred from the claim text.