Film formation apparatus and film formation method
AssigneesDenso Corporation, National University Corporation Kyoto Institute of Technology
InventorsTatsuji Nagaoka, Fumiaki Kawai, Hiroyuki Nishinaka, Masahiro Yoshimoto
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Abstract
A film formation apparatus is configured to supply mist of a solution to a surface of a substrate so as to grow a film on the surface of the substrate, and the film formation apparatus may include: a furnace configured to house the substrate so as to heat the substrate; and a mist supply apparatus configured to supply the mist of the solution to the furnace, in which the film formation apparatus includes a portion configured to be exposed to the mist, and at least a part of the portion of the film formation apparatus is constituted of a material comprising boron nitride.
Claims2
A method of growing a film using a film formation apparatus configured to supply a mist of a solution to a surface of a substrate to grow the film on the surface of the substrate, the film formation apparatus comprising:
- a furnace configured to house the substrate and to heat the substrate;
- a mist supply apparatus configured to supply the mist of the solution to the furnace;
- a portion configured to be exposed to the mist;
- and
- at least a part of the portion of the film formation apparatus is constituted of a material comprising boron nitride,
- the method comprising:
- in a state where the substrate is not placed in the furnace, supplying a liquid or mist of the liquid to the material comprising boron nitride so as to coat a surface of the material comprising boron nitride, the liquid comprising a component included in the solution;
- and
- in a state where the substrate is placed in the furnace after the coating of the material, supplying the mist of the solution from the mist supply apparatus to the furnace so as to grow the film on the surface of the substrate.
Dependencies are inferred from the claim text.