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US 11,142,819 B2Granted
Sputtering target
AssigneeSumitomo Chemical Company, Limited
InventorsHiroyuki Tsukada, Masahiro Fujita, Koji Nishioka
Life of this patent
Estimating the term…
Abstract
Provided is a sputtering target that is less likely to cause abnormal discharge. The sputtering target has a sputtering surface in which a lightness L in a Lab color system is more than 27 and 51 or less.
Claims5
A sputtering target consisting of metal or an alloy, and having a sputtering surface in which a lightness L in a Lab color system is more than 27 and 51 or less.
Dependencies are inferred from the claim text.