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US 11,135,241 B2Granted
Compositions and methods to affect skin irritation
AssigneesAlumend, LLC, Wavepharma, LLC
InventorsRonald E. Utecht, Therese M. Downey, Miri Seiberg, Stanley S. Shapiro, Jack V. Foster, Jr.
Life of this patent
Estimating the term…
Abstract
Compositions are described that contain treated chitosan, modified chitosan and/or modified and treated chitosan for use in formulations for skin, hair and nails, and in compositions and methods of reducing topical agent-induced skin irritation and inflammation.
Claims10
A composition comprising:
- (a) at least one topical irritating agent comprising sodium dodecyl sulfate (SDS) in an amount of 0.04-5% W/V of the total weight of the composition, and
- (b) at least one chitosan covalently modified with octane sulfonic acid via sulfonamide linkage (OsC), wherein the OsC is present in an amount of about 0.5-5% W/V of the total weight of the composition, and wherein the composition provides a reduction in skin irritation and/or a reduction in skin inflammation and/or a reduction in the topical irritating agent-induced IL-1α secretion caused by duration of contact between skin and the composition compared with a control composition comprising the topical irritating agent but not the chitosan.
Dependencies are inferred from the claim text.