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US 11,130,985 B2Granted
Spot array substrate, method for producing same, and nucleic acid polymer analysis method and device
AssigneeHitachi High-Tech Corporation
InventorsNaoshi Itabashi, Sonoko Migitaka, Masatoshi Narahara, Tomohiro Shoji, Yukio Ono
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Abstract
In order to reduce the cost of producing a spot array substrate and reduce the cost of nucleic acid polymer analysis, a spot array substrate is used which is produced by preparing a resin substrate 402 having a surface on which an uneven pattern is formed and a plurality of bead sitting positions set in a two-dimensional array within the uneven pattern, and loading surface-modified beads onto the bead sitting positions of the resin substrate.
Claims9
A spot array substrate comprising:
- a resin substrate having a surface including an uneven pattern that includes a plurality of grooves that form rhombic patterns, and a plurality of bead sitting positions set in a two-dimensional array within the uneven pattern;
- and
- a plurality of surface-modified beads loaded into the bead sitting positions of the resin substrate,
- wherein a thermal expansion coefficient of a material of the resin substrate is in a range from 10−5 to 10−4/° C.,
- wherein the plurality of bead sitting positions are intersections of the plurality of grooves disposed in the resin substrate,
- wherein an epoxy group is disposed as a film only on inner surfaces of the respective plurality of grooves of the resin substrate,
- wherein the respective surface-modified beads loaded in the bead sitting positions are physically clamped by inner surfaces of the grooves of the bead sitting positions, which are physically contracted, and
- wherein the surface-modified beads are at least one of functional group surface-modified beads and oligo DNA surface-modified beads.
5 more elements
Dependencies are inferred from the claim text.