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US 11,123,362 B2Granted
Compositions and methods to affect skin irritation
AssigneesAlumend, LLC, Wavepharma, LLC
InventorsRonald E. Utecht, Therese M. Downey, Miri Seiberg, Stanley S. Shapiro, Jack V. Foster, Jr.
Life of this patent
Estimating the term…
Abstract
Compositions are described that contain treated chitosan, modified chitosan and/or modified and treated chitosan for use in formulations for skin, hair and nails, and in compositions and methods of reducing topical agent-induced skin irritation and inflammation.
Claims12
A method for reducing skin inflammation and/or skin irritation and/or topical irritant-induced IL-1α secretion, comprising topically applying a composition comprising:
- (a) at least one topical irritating agent comprising sodium dodecyl sulfate (SDS) or a sunscreen agent that causes skin inflammation and/or skin inflammation and/or an increase in IL-1α secretion, or a combination thereof, wherein the SDS or the sunscreen agent is present in an amount of 0.04-5% W/V of the total weight of the composition;
- and
- (b) at least one chitosan covalently modified with octane sulfonic acid via sulfonamide linkage (OsC), wherein the OsC is present in an amount of about 0.5-5% W/V of the total weight of the composition, wherein duration of contact between skin and the composition results in skin irritation, skin inflammation and/or IL-1α secretion, and wherein the composition provides a reduction in the skin irritation and/or a reduction in the skin inflammation and/or a reduction in the IL-1α secretion after contact with the composition compared with a control composition comprising the topical irritating agent but not the chitosan.
Dependencies are inferred from the claim text.