# US 11,122,672 B2 · Adjustable sample floor for ultrafast signal washout > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,122,672 B2 - Document ID: US11122672B2 - Status: Granted - Kind: B2 - Application number: 16/605,392 - Filed: 2018-04-20 - Published: 2020-02-13 - Granted: 2021-09-14 - Earliest claimed: 2017-04-20 - Assignees: Elemental Scientific Lasers, LLC - Applicants: Elemental Scientific Lasers, LLC - Inventors: Leif C. Summerfield; Brock Meyer - Web page: https://patentgrep.com/patent/US11122672B2 ## CPC - B01L 9/00: Supporting devices; Holding devices - H05H 1/26: Plasma torches - B01L 99/00: Subject matter not provided for in other groups of this subclass - H01J 49/0418: {for laser desorption, e.g. matrix-assisted laser desorption/ionisation [MALDI] plates or surface enhanced laser desorption/ionisation [SELDI] plates} - H01J 49/0463: {Desorption by laser or particle beam, followed by ionisation as a separate step (sample holder per se H01J49/0418)} - H01J 49/105: {using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]} - B01L 2200/025: Align devices or objects to ensure defined positions relative to each other - B01L 2300/0809: rectangular shaped - G01N 2001/045: {Laser ablation; Microwave vaporisation} - B01L: CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE - H05H: PLASMA TECHNIQUE (apparatus or processes specially adapted for producing X-rays H05G2/00); PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - G01N: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing apparatus or processes other than immunoassay, involving enzymes or microorganisms C12M, C12Q) ## Abstract Systems and methods for an adjustable sample floor for ultrafast signal washout are disclosed. In an embodiment. A target support configured to adjustably support a target within a sample chamber may include: a support frame that may configured to be inserted into the sample chamber, a support platform that may be disposed within the support frame, and a platform adjustment system that may be coupled to the support frame and the support platform. The platform adjustment system may be configured to adjust at least one of: a position and an orientation of the support platform relative to the support frame when the support frame is inserted into the sample chamber. ## Claims ### Claim 1 A target support configured to adjustably support a target within a sample chamber, comprising: a support frame configured to be inserted into the sample chamber; a support platform disposed within the support frame; and a platform adjustment system coupled to the support frame and the support platform, the platform adjustment system including one or more adjustment rods coupled to a first end of one or more screws; one or more threaded bores coupled to the support frame and configured to engage threads of the one or more screws, wherein a second end of one or more screws is configured to be displaced along an x-axis when the one or more screws rotate relative to the one or more threaded bores; and one or more surfaces extending from the support platform, the one or more surfaces configured to change a position of the support platform relative to the support frame upon interaction between the second end of one or more screws and the one or more surfaces, wherein the platform adjustment system is configured to adjust at least one of: a position and an orientation of the support platform relative to the support frame when the support frame is inserted into the sample chamber. ### Claim 2 (depends on 1) The target support of claim 1, wherein the platform adjustment system further comprises: one or more platform adjustment knobs, wherein the one or more adjustment rods are disposed between the one or more platform adjustment knobs and the first end of one or more screws, the one or more platform adjustment knobs rotatable to engage the one or more screws; wherein the one or more threaded bores are coupled to the support frame by a bracket, wherein the second end of the one or more screws includes one or more tip portions, the one or more tip portions configured to be displaced along an x-axis when the one or more screws rotate relative to the one or more threaded bores, and wherein the one or surfaces extending from the support platform include one or more wedges fixed to a lower surface of the support platform, wherein the one or more wedges comprise: a relatively thin end, a relatively thick end, and an inclined surface extending from the relatively thin end to the relatively thick end, the one or more wedges configured to change a position of the support platform relative to the support frame. ### Claim 3 (depends on 2) The target support of claim 2, wherein the one or more wedges comprise a groove provided on the inclined surface and configured to receive a portion of the one or more tip portions. ### Claim 4 (depends on 2) The target support of claim 2, wherein a thread pitch and a helix angle of the one or more screws, the thread pitch and the helix angle of the one or more threaded bores, and a slope of the inclined surface of the one or more wedges are configured to modify a position of one or more regions of the support platform relative to a depth of focus of a focused beam of laser pulses directed into the sample chamber. ### Claim 5 (depends on 2) The target support of claim 2, wherein a thread pitch and a helix angle of the one or more screws, the thread pitch and the helix angle of the one or more threaded bores, and a slope of the inclined surface of the one or more wedges are configured to modify a position of the support platform in a range from 1 μm to 1 mm along the z-axis per one full rotation of the platform adjustment knob. ### Claim 6 (depends on 1) The target support of claim 1, wherein the target support further comprises a system of rails and grooves configured to partially restrict movement of the support platform along a plane defined by the x-axis and the y-axis. ### Claim 7 (depends on 1) The target support of claim 1, wherein the platform adjustment system configured to adjust at least of the position and the orientation of the support platform further comprises: adjusting the support platform along an x-axis, adjusting the support platform along a y-axis, and adjusting the support platform along a z-axis. ### Claim 8 A method, comprising: adjusting a target support configured to support a target within a sample chamber, the target support comprising: a support frame configured to be inserted into the sample chamber; a support platform disposed within the support frame; and a platform adjustment system coupled to the support frame and the support platform, the platform adjustment system including one or more adjustment rods coupled to a first end of one or more screws; one or more threaded bores coupled to the support frame and configured to engage threads of the one or more screws, wherein a second end of one or more screws is configured to be displaced along an x-axis when the one or more screws rotate relative to the one or more threaded bores; and one or more surfaces extending from the support platform, the one or more surfaces configured to change a position of the support platform relative to the support frame upon interaction between the second end of one or more screws and the one or more surfaces, wherein the platform adjustment system is configured to adjust at least one of: a position and an orientation of the support platform relative to the support frame when the support frame is inserted into the sample chamber. ### Claim 9 (depends on 8) The method of claim 8, further comprising: adjusting the support platform along an x-axis, adjusting the support platform along a y-axis, and adjusting the support platform along a z-axis. ### Claim 10 (depends on 8) The method of claim 8, wherein the platform adjustment system further comprises: one or more platform adjustment knobs, wherein the one or more adjustment rods are disposed between the one or more platform adjustment knobs and the first end of one or more screws, the one or more platform adjustment knobs rotatable to engage the one or more screws; wherein the one or more threaded bores are coupled to the support frame by a bracket, wherein the second end of the one or more screws includes one or more tip portions, the one or more tip portions configured to be displaced along an x-axis when the one or more screws rotate relative to the one or more threaded bores, and wherein the one or surfaces extending from the support platform include one or more wedges fixed to a lower surface of the support platform, wherein the one or more wedges comprise: a relatively thin end, a relatively thick end, and an inclined surface extending from the relatively thin end to the relatively thick end, the one or more wedges configured to change a position of the support platform relative to the support frame. ### Claim 11 (depends on 10) The method of claim 10, wherein the one or more wedges comprises a groove provided on the inclined surface and configured to receive a portion of the one or more tip portions. ### Claim 12 (depends on 10) The method of claim 10, wherein a thread pitch and a helix angle of the one or more screws, the thread pitch and the helix angle of the one or more threaded bores, and a slope of the inclined surface of the one or more wedges are configured to modify a position of one or more regions of the support platform relative to a depth of focus of a focused beam of laser pulses directed into the sample chamber. ### Claim 13 (depends on 10) The method of claim 10, wherein a thread pitch and a helix angle of the one or more screws, the thread pitch and the helix angle of the one or more threaded bores, and a slope of the inclined surface of the one or more wedges are configured to modify a position of the support platform in a range from 1 μm to 1 mm along the z-axis per one full rotation of the platform adjustment knob. ### Claim 14 (depends on 8) The method of claim 8, wherein the target support further comprises a system of rails and grooves configured to partially restrict movement of the support platform along a plane defined by the x-axis and the y-axis. ### Claim 15 A sample chamber configured to accommodate a target, comprising: a sample chamber body; a transmission window; a sample capture cell; and a target support configured to adjustably support the target within the sample chamber, wherein the target support comprises: a support frame configured to be inserted into the sample chamber; a support platform disposed within the support frame; and a platform adjustment system coupled to the support frame and the support platform, the platform adjustment system including one or more adjustment rods coupled to a first end of one or more screws; one or more threaded bores coupled to the support frame and configured to engage threads of the one or more screws, wherein a second end of one or more screws is configured to be displaced along an x-axis when the one or more screws rotate relative to the one or more threaded bores; and one or more surfaces extending from the support platform, the one or more surfaces configured to change a position of the support platform relative to the support frame upon interaction between the second end of one or more screws and the one or more surfaces, wherein the platform adjustment system is configured to adjust at least one of: a position and an orientation of the support platform relative to the support frame when the support frame is inserted into the sample chamber. ### Claim 16 (depends on 15) The sample chamber of claim 15, wherein the platform adjustment system configured to adjust at least of the position and the orientation of the support platform further comprises: adjusting the support platform along an x-axis, adjusting the support platform along a y-axis, and adjusting the support platform along a z-axis. ### Claim 17 (depends on 15) The sample chamber of claim 15, wherein the platform adjustment system further comprises: one or more platform adjustment knobs, wherein the one or more adjustment rods are disposed between the one or more platform adjustment knobs and the first end of one or more screws, the one or more platform adjustment knobs rotatable to engage the one or more screws; wherein the one or more threaded bores are coupled to the support frame by a bracket, wherein the second end of the one or more screws includes one or more tip portions, the one or more tip portions configured to be displaced along an x-axis when the one or more screws rotate relative to the one or more threaded bores, and wherein the one or surfaces extending from the support platform include one or more wedges fixed to a lower surface of the support platform, wherein the one or more wedges comprise: a relatively thin end, a relatively thick end, and an inclined surface extending from the relatively thin end to the relatively thick end, the one or more wedges configured to change a position of the support platform relative to the support frame. ### Claim 18 (depends on 17) The sample chamber of claim 17, wherein the one or more wedges comprises a groove provided on the inclined surface and configured to receive a portion of the one or more tip portions. ### Claim 19 (depends on 17) The sample chamber of claim 17, wherein a thread pitch and a helix angle of the one or more screws, the thread pitch and the helix angle of the one or more threaded bores, and a slope of the inclined surface of the one or more wedges are configured to modify a position of one or more regions of the support platform relative to a depth of focus of a focused beam of laser pulses directed into the sample chamber. ### Claim 20 (depends on 17) The sample chamber of claim 17, wherein a thread pitch and a helix angle of the one or more screws, the thread pitch and the helix angle of the one or more threaded bores, and a slope of the inclined surface of the one or more wedges are configured to modify a position of the support platform in a range from 1 μm to 1 mm along the z-axis per one full rotation of the platform adjustment knob.