Particle prevention method in lithography exposure apparatus
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYi-Wei Lee, Jui-Chieh Chen, Chih-Tsung Shih, Tsung-Chuan Lee
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Abstract
In accordance with some embodiments, a method for processing a semiconductor wafer is provided. The method includes transporting a carrier along with a reticle supported by the carrier in a lithography exposure apparatus. The method also includes regulating particles in the carrier through a magnetic field. In addition, the method includes removing the reticle from the carrier. The method further includes performing, using the reticle, a lithography exposure process to the semiconductor wafer in the lithography exposure apparatus.
Claims20
A method of processing a semiconductor wafer, comprising:
- transporting a carrier along with a reticle supported by the carrier in a lithography exposure apparatus;
- regulating particles in the carrier through a magnetic field generated by a magnetic element positioned in the carrier, wherein regulating particles in the carrier comprises collecting the particles in a groove that is formed in the magnetic element;
- removing the reticle from the carrier;
- and
- performing, using the reticle, a lithography exposure process to the semiconductor wafer in the lithography exposure apparatus.
A method of transporting a reticle for semiconductor fabrication, comprising:
- transporting a carrier along with a reticle supported by the carrier;
- creating an air flow around the reticle;
- generating a magnetic field through at least one electromagnet located adjacent to a position at which the reticle is placed in a lithography exposure apparatus, wherein the magnetic field is generated during the creation of the air flow around the reticle;
- and
- regulating particles in the carrier through the magnetic field during the creation of the air flow.
A carrier for storing a reticle, comprising:
- a baseplate having an inner region and an outer region surrounding the inner region, wherein the baseplate comprises a plurality of stubs arranged on a boundary of the inner region and the outer region;
- an upper lid connected to the baseplate to form a space for receiving the reticle;
- and
- a first magnetic element positioned on one of the baseplate and the upper lid, wherein a projection of the first magnetic element overlaps the inner region of the baseplate, and the first magnetic element has a groove formed with a ring shape, and an outer wall of the groove is located in the outer region and an inner wall of the groove is located in the inner region.
Dependencies are inferred from the claim text.