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US 11,114,586 B2Granted
Semiconductor light emitting device
AssigneesKabushiki Kaisha Toshiba, Toshiba Electronic Devices & Storage Corporation
InventorHideto Sugawara
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Abstract
According to one embodiment, a semiconductor light emitting device includes a substrate, and a multi quantum well layer provided on the substrate, and including a plurality of barrier layers sandwiched between three or more InGaAs well layers and two InGaAs well layers. The barrier layers include at least two regions having different mixed crystal ratios or at least two regions having different thicknesses.
Claims9
A semiconductor light emitting device, comprising:
- a substrate;
- and
- a multi quantum well layer provided on the substrate,
- the multi quantum well layer including a plurality of InGaAs well layers and a plurality of barrier layers, the plurality of barrier layers each being made of AlGaAsP mixed crystal represented by a formula AlzGa1-zAs1-yPy(0≤z<1, 0<y<1), the InGaAs well layers and the barrier layers being stacked alternately in a first direction from a substrate toward the multi quantum well layer, the plurality of barrier layers including first barrier layers and second barrier layers, a group of the second barrier layers being provided next to a group of the first barrier layers,
- wherein the first barrier layers each include a first AlGaAsP mixed crystal represented by a formula AlzGa1-zAs1-yPy(0≤z<1, 0<y<1) and the second barrier layers each include a second AlGaAsP mixed crystal represented by a formula AlzGa1-zAs1-y2Py2 (0≤z<1, 0<y1<1<y2<1);
- or
- wherein the first barrier layers have first thicknesses in the first direction, respectively, and the second barrier layers have second thicknesses in the first direction, respectively, the second thicknesses being larger than the first thicknesses.
4 more elements
Dependencies are inferred from the claim text.