# US 11,114,496 B2 · Active matrix substrate, X-ray imaging panel with the same, and method for producing the same

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- Number: US 11,114,496 B2
- Document ID: US11114496B2
- Status: Granted
- Kind: B2
- Application number: 16/775,020
- Filed: 2020-01-28
- Published: 2020-07-30
- Granted: 2021-09-07
- Earliest claimed: 2019-01-30
- Assignees: Sharp Kabushiki Kaisha
- Applicants: Sharp Kabushiki Kaisha
- Inventors: Makoto Nakazawa
- Web page: https://patentgrep.com/patent/US11114496B2

## CPC

- H10F 39/1898: {Indirect radiation image sensors, e.g. using luminescent members}
- H10F 39/016: {of thin-film-based image sensors}
- H10F 39/8037: {the integrated elements comprising a transistor}
- H10F 39/151: {Geometry or disposition of pixel elements, address lines or gate electrodes}
- H10F: INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION

## Abstract

An active matrix substrate includes: a photoelectric conversion element 15; an electrode 14b provided with a first opening h1 and disposed on one surface of the photoelectric conversion element 15; an organic insulating film 106 provided with a second opening h2 and covering the photoelectric conversion element 15 and the electrode 14b; and a conductive film 16 for supplying a bias voltage to the electrode 14b. The first opening h1 and the second opening h2 overlap each other when viewed in plan view. The conductive film 16 is provided inside the first opening h1 and the second opening h2 so as to be in contact with the electrode 14b.

## Claims

### Claim 1

An active matrix substrate comprising:
a photoelectric conversion element;
an electrode provided with a first opening, the electrode being disposed on one surface of the photoelectric conversion element;
an organic insulating film provided with a second opening, the organic insulating film covering the photoelectric conversion element and the electrode; and
a conductive film for supplying a bias voltage to the electrode,
wherein the first opening and the second opening overlap each other when viewed in plan view, and
the conductive film is provided inside the first opening and the second opening so as to be in contact with the electrode.

### Claim 2 (depends on 1)

The active matrix substrate according to claim 1,
wherein the electrode is a transparent conductive film that contains indium, at least one of zinc and tin, and oxygen.

### Claim 3 (depends on 1)

The active matrix substrate according to claim 1,
wherein the conductive film is a bias line that is made of a metal material and extends in one direction on the photoelectric conversion element.

### Claim 4 (depends on 3)

The active matrix substrate according to claim 3, further comprising an inorganic insulating film provided with a third opening, the inorganic insulating film covering a surface of the electrode and a surface of the photoelectric conversion element,
wherein the organic insulating film covers a surface of the inorganic insulating film, and
the second opening is formed farther inward than the third opening, and the first opening is formed farther inward than the second opening.

### Claim 5 (depends on 3)

The active matrix substrate according to claim 3, further comprising an inorganic insulating film provided with a third opening, the inorganic insulating film covering a surface of the electrode and a surface of the photoelectric conversion element,
wherein the organic insulating film covers a surface of the inorganic insulating film, and
the second opening and the third opening have rectangular shapes with their long sides extending substantially parallel to an extending direction of the bias line when viewed in plan view.

### Claim 6 (depends on 1)

The active matrix substrate according to claim 1,
wherein the conductive film is made of a transparent conductive material, and
the active matrix substrate further includes a bias line that is connected to the conductive film and to which the bias voltage is suppled.

### Claim 7 (depends on 1)

An X-ray imaging panel comprising:
the active matrix substrate according to claim 1; and
a scintillator for converting X-rays incident thereon to scintillation light.

### Claim 8

A method for producing an active matrix substrate, the method comprising:
forming a photoelectric conversion element on a substrate;
forming an electrode on one surface of the photoelectric conversion element;
forming an organic insulating film that covers the photoelectric conversion element and the electrode and forming an opening of the organic insulating film at a position where the opening overlaps the electrode when viewed in plan view;
forming, after the opening of the organic insulating film has been formed, an opening of the electrode at a position where the opening of the electrode overlaps the opening of the organic insulating film when viewed in plan view; and
forming a conductive film inside the opening of the electrode and the opening of the organic insulating film so as to be in contact with the electrode.

### Claim 9 (depends on 8)

The method according to claim 8, further comprising, after the opening of the electrode has been formed, expanding the opening of the organic insulating film such that the opening of the organic insulating film is disposed farther outward than the opening of the electrode when viewed in plan view,
wherein the opening of the electrode is formed using the organic insulating film as a mask.

### Claim 10 (depends on 8)

The method according to claim 8, further comprising, after the electrode has been formed, forming an inorganic insulating film that covers a surface of the electrode and a surface of the photoelectric conversion element and forming an opening of the inorganic insulating film at a position where the opening overlap the photoelectric conversion element when viewed in plan view,
wherein the opening of the inorganic insulating film overlaps the opening of the organic insulating film and the opening of the electrode when viewed in plan view, and the conductive film is formed inside the opening of the inorganic insulating film, the opening of the organic insulating film, and the opening of the electrode.
