Integrated circuit device including support patterns and method of manufacturing the same

An integrated circuit device comprising:

• a plurality of lower electrodes arranged on a substrate and spaced apart from each other;
• an upper support pattern extending in a lateral direction parallel to the substrate, the upper support pattern having a plurality of holes through which the plurality of lower electrodes pass;
• and
• a plurality of upper spacer support patterns arranged inside the plurality of holes in a one-to-one manner, and
• each of the plurality of upper spacer support patterns comprises an outer sidewall in contact with the upper support pattern and an inner sidewall in contact with a corresponding one of the plurality of lower electrodes, and has a width in the lateral direction decreasing in a direction toward the substrate.

An integrated circuit device comprising:

• a plurality of lower electrodes arranged on a substrate and spaced apart from each other;
• an upper support structure comprising an upper support pattern and a plurality of upper spacer support patterns, the upper support pattern extending in a lateral direction parallel to the substrate and having a plurality of holes through which the plurality of lower electrodes pass, the plurality of upper spacer support patterns arranged inside the plurality of holes in a one-to-one manner;
• a lower support pattern extending in the lateral direction between the substrate and the upper support structure and being in contact with the plurality of lower electrodes;
• a dielectric film being in contact with the plurality of lower electrodes, the upper support pattern, the plurality of upper spacer support patterns, and the lower support pattern;
• and
• an upper electrode located opposite to the plurality of lower electrodes with the dielectric film therebetween,
• wherein each of the plurality of upper spacer support patterns has an outer sidewall in contact with the upper support pattern inside a corresponding one of the plurality of holes and an inner sidewall in contact with a corresponding one of the plurality of lower electrodes, and has a width in the lateral direction, the width decreasing in a direction toward the substrate.