ESC substrate support with chucking force control
AssigneeApplied Materials, Inc.
InventorsWendell Glenn Boyd, Jr., Jim Zhongyi He, Zhenwen Ding
Life of this patent
Estimating the term…
Loading patent…
AssigneeApplied Materials, Inc.
InventorsWendell Glenn Boyd, Jr., Jim Zhongyi He, Zhenwen Ding
Estimating the term…
Embodiments described herein provide methods and apparatus used to reduce or substantially eliminate undesirable scratches to the non-active surface of a substrate by monitoring and controlling the deflection of a substrate, and thus the contact force between the substrate and a substrate support, during substrate processing. In one embodiment a method for processing a substrate includes positioning the substrate on a patterned surface of a substrate support, where the substrate support is disposed in a processing volume of a processing chamber, applying a chucking voltage to a chucking electrode disposed in the substrate support; flowing a gas into a backside volume disposed between the substrate and the substrate support, monitoring a deflection of the substrate, and changing a chucking parameter based on the deflection of the substrate.
An apparatus for processing a substrate, the apparatus comprising a substrate support assembly, comprising:
An apparatus for processing a substrate, comprising:
A substrate support assembly sized to support a substrate having a first surface area, the substrate support assembly comprising:
Dependencies are inferred from the claim text.