# US 11,114,325 B2 · Fume-removing device

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- Number: US 11,114,325 B2
- Document ID: US11114325B2
- Status: Granted
- Kind: B2
- Application number: 15/113,221
- Filed: 2015-01-16
- Published: 2017-01-12
- Granted: 2021-09-07
- Earliest claimed: 2014-01-21
- Assignees: Bum Je Woo
- Applicants: Bum Je Woo
- Inventors: Bum Je Woo; Sang Hyun Kim; Myoung Sok Han; Young Chul Kim
- Web page: https://patentgrep.com/patent/US11114325B2

## CPC

- H10P 72/1924: {characterised by atmosphere control}
- H10P 72/14: {Vertical carrier comprising wall type elements whereby the substrates are horizontally supported, e.g. comprising sidewalls}
- H10P 72/1921: {characterised by substrate supports}
- H10P 72/1926: {characterised by the presence of atmosphere modifying elements inside or attached to the closed carrier}
- H10P 72/3214: {by means of a cart or a vehicle}
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

The present invention relates to an apparatus for removing fume which includes, a wafer cassette for stacking wafers; and an exhaust for exhausting the fume of the wafers stacked in the wafer cassette, wherein the wafer cassette includes stacking shelves provided at both sides for stacking wafers; and a front opening for incoming and outgoing of the wafers which are being stacked in the stacking shelf, wherein the stacking shelves include multiple inclined ramp portions which are slanted towards the wafers stacked in the stacking shelves as they travel towards the front opening, wherein a purge gas outlet is provided in the inclined ramp portion for supplying purge gas for the wafers stacked in the stacking shelves. According to the present invention, the residual process gases on wafers can be removed efficiently.

## Claims

### Claim 1

An apparatus for removing fume including:
a wafer cassette;
an exhaust for exhausting the fume;
stacking shelves provided within said wafer cassette at both sides of said wafer cassette; and
a front opening provided in front of said wafer cassette,
wherein said stacking shelves include a first stacking shelf and a second stacking shelf below said first stacking shelf, and the first stacking shelf and the second stacking shelf are vertically spaced apart,
wherein said first stacking shelf includes:
a purge gas inlet provided in said first stacking shelf;
a purge gas flow path provided within said first stacking shelf in a horizontal direction, for flowing purge gas supplied via said purge gas inlet, said purge gas flow path including a main flow path connected to said purge gas inlet and branch flow paths branched from said main flow path;
purge gas outlets formed on a side surface of said first stacking shelf and communicating with said branch flow paths, respectively, for supplying said purge gas into said wafer cassette, wherein some of the purge gas outlets are formed on a flat side of said side surface of said first stacking shelf and the rest of the purge gas outlets are formed on a curved side of said side surface of said first stacking shelf; and
a pin provided on said curved side where the rest of the purge gas outlets are formed for directly supporting a wafer,
wherein the apparatus further includes a side gas tube coupled to said purge gas inlet for supplying said purge gas to said purge gas inlet, and
wherein said first stacking shelf extends toward said wafer for limiting a vertical flow of said purge gas which is supplied through said purge gas outlets.

### Claim 2 (depends on 1)

The apparatus for removing fume according to claim 1, wherein each of said branch flow paths is arranged to have an obtuse angle with said main flow path.

### Claim 3 (depends on 1)

The apparatus for removing fume according to claim 1, wherein said wafer cassette is provided such that at least a part thereof is transparent.

### Claim 4 (depends on 1)

The apparatus for removing fume according to claim 1, wherein a punching plate is provided at a back surface and communicates with said wafer cassette and said exhaust, and
wherein said punching plate includes an array of air suction holes whose widths are getting wider in a vertically upward direction.

### Claim 5 (depends on 1)

The apparatus for removing fume according to claim 1, further comprising a tube communicating with an exhausting gas pressure sensor for detecting exhausting pressure of the fume.

### Claim 6 (depends on 1)

The apparatus for removing fume according to claim 1, wherein a first sensor is further included inside said wafer cassette for detecting whether any wafer exists therein.

### Claim 7 (depends on 1)

The apparatus for removing fume according to claim 1, a heating member is further included for heating the inside of said wafer cassette,
wherein said heating member includes:
an upper heater provided on an upper surface of the case of said wafer cassette; and
a lower heater provided on a lower surface of the case of said wafer cassette.