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US 11,113,827 B2Granted
Pattern-to-design alignment for one-dimensional unique structures
AssigneeKLA Corporation
InventorBjorn Brauer
Life of this patent
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Abstract
Care areas for a first image of a die can be determined according to a 1D offset correction. The 1D offset correction can be based on 1D offsets between the first image and a second image for each of the image frames and also can be based on 1D offsets between a design and the second image for each of the image frames. The care areas can have a zero border for a dimension that is aligned to the design and a legacy border for the other dimension.
Claims19
A system comprising:
- an energy source that generates an energy beam;
- a stage configured to secure a wafer in a path of the energy beam;
- a detector that receives the energy beam reflected from the wafer on the stage;
- and
- a processor in electronic communication with the detector;
- wherein the processor is configured to:
- determine one or more care areas for a first image of a die on the wafer according to a 1D offset correction, wherein the 1D offset correction is based on a 1D offset between the first image and a second image for each of image frames and the 1D offset correction is further based on a 1D offset between a design and the second image for each of the image frames.
4 more elements
A method comprising:
- determining, using a processor, one or more care areas for a first image of a die according to a 1D offset correction, wherein the 1D offset correction is based on a 1D offset between the first image and a second image for each of image frames and the 1D offset correction is further based on a 1D offset between a design and the second image for each of the image frames.
Dependencies are inferred from the claim text.