Photosensitive composition, cured film, optical filter, solid image pickup element, image display device, and infrared sensor
AssigneeFUJIFILM Corporation
InventorKyohei Arayama
Life of this patent
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Abstract
Provided are a photosensitive composition with which a cured film having excellent heat resistance and pattern formability can be formed, a cured film, an optical filter, a solid image pickup element, an image display device, and an infrared sensor. This photosensitive composition includes an infrared shielding agent A, a polymer component B, and a photoacid generator C. The polymer component B in the photosensitive composition includes, for example, a polymer B1 that includes a repeating unit b1 having a group in which at least one group selected from an acid group or a hydroxyl group is protected by an acid-decomposable group and a repeating unit b2 having a crosslinking group.
Claims28
A photosensitive composition comprising an infrared shielding agent A, a polymer component B, a photoacid generator C, and a coloring material that allows transmission of infrared light and shields visible light,
- wherein the infrared shielding agent A is at least one selected from the group consisting of a diiminium compound, a squarylium compound, a cyanine compound, a phthalocyanine compound, a naphthalocyanine compound, a quaterrylene compound, an aminium compound, an iminium compound, an azo compound, an anthraquinone compound, a porphyrin compound, a pyrrolopyrrole compound, an oxonol compound, a croconium compound, a hexaphyrin compound, a metal dithiol compound, a copper compound, a tungsten compound, and a metal boride,
- wherein at least one of the following requirement (1), (2), (3) or (4) is satisfied,
- (1) the polymer component B includes a polymer B1 that includes a repeating unit b1 having a group in which at least one group selected from an acid group or a hydroxyl group is protected by an acid-decomposable group and a repeating unit b2 having a crosslinking group,
- (2) the polymer component B includes a polymer B2 including the repeating unit b1 and a polymer B3 including the repeating unit b2,
- (3) the polymer component B includes the polymer B2 and the photosensitive composition further comprises a compound having a molecular weight of 1000 or lower that has a crosslinking group, and
- (4) the polymer component B includes the polymer B3 and the photosensitive composition further comprises a compound having a molecular weight of 1000 or lower that has a group in which at least one group selected from an acid group or a hydroxyl group is protected by an acid-decomposable group.
A photosensitive composition comprising an infrared shielding agent A, a polymer component B, and a photoacid generator C,
- wherein the infrared shielding agent A is at least one selected from the group consisting of a diiminium compound, a squarylium compound, a cyanine compound, a phthalocyanine compound, a naphthalocyanine compound, a quaterrylene compound, an aminium compound, an iminium compound, an azo compound, an anthraquinone compound, a porphyrin compound, a pyrrolopyrrole compound, an oxonol compound, a croconium compound, a hexaphyrin compound, a metal dithiol compound, a copper compound, a tungsten compound, and a metal boride,
- wherein at least one of the following requirement (1), (2), (3) or (4) is satisfied,
- (1):
- the polymer component B includes a polymer B1 that includes a repeating unit b1 having a group in which at least one group selected from an acid group or a hydroxyl group is protected by an acid-decomposable group and a repeating unit b2 having a crosslinking group,
- (2):
- the polymer component B includes a polymer B2 including the repeating unit b1 and a polymer B3 including the repeating unit b2,
- (3):
- the polymer component B includes the polymer B2 and the photosensitive composition further comprises a compound having a molecular weight of 1000 or lower that has a crosslinking group, and
- (4):
- the polymer component B includes the polymer B3 and the photosensitive composition further comprises a compound having a molecular weight of 1000 or lower that has a group in which at least one group selected from an acid group or a hydroxyl group is protected by an acid-decomposable group,
- wherein the crosslinking group of the requirement (1) is located in the side chain of the polymer B1, and
- wherein the compound having a molecular weight of 1000 or lower that has a crosslinking group of the requirement (3) is a compound having one or more groups of at least one kind selected from an epoxy group, an oxetanyl group, a methylol group, an alkoxymethylol group, a blocked isocyanate group, and an ethylenically unsaturated bond group.
A photosensitive composition comprising an infrared shielding agent A, a polymer component B, and a photoacid generator C,
- wherein the infrared shielding agent A is at least one selected from the group consisting of a diiminium compound, a squarylium compound, a cyanine compound, a phthalocyanine compound, a naphthalocyanine compound, a quaterrylene compound, an aminium compound, an iminium compound, an azo compound, an anthraquinone compound, a porphyrin compound, a pyrrolopyrrole compound, an oxonol compound, a croconium compound, a hexaphyrin compound, a metal dithiol compound, a copper compound, a tungsten compound, and a metal boride,
- wherein at least one of the following requirement (1), (2), (3) or (4) is satisfied,
- (1):
- the polymer component B includes a polymer B1 that includes a repeating unit b1 having a group in which at least one group selected from an acid group or a hydroxyl group is protected by an acid-decomposable group and a repeating unit b2 having a crosslinking group,
- (2):
- the polymer component B includes a polymer B2 including the repeating unit b1 and a polymer B3 including the repeating unit b2,
- (3):
- the polymer component B includes the polymer B2 and the photosensitive composition further comprises a compound having a molecular weight of 1000 or lower that has a crosslinking group, and
- (4):
- the polymer component B includes the polymer B3 and the photosensitive composition further comprises a compound having a molecular weight of 1000 or lower that has a group in which at least one group selected from an acid group or a hydroxyl group is protected by an acid-decomposable group, and
- wherein the photosensitive composition is a positive photosensitive composition.
Dependencies are inferred from the claim text.