Black matrix substrate and display device

A black matrix substrate, comprising:

• a transparent substrate having a first surface and a second surface opposite to the first surface;
• a black dielectric layer formed on the second surface;
• a first insulating layer formed on the black dielectric layer;
• a first conductive layer formed on the first insulating layer and including a first conductive pattern that includes a metal layer or an alloy layer sandwiched between conductive oxide layers;
• a second insulating layer formed on the first conductive pattern;
• an oxide semiconductor layer formed on the second insulating layer;
• a second conductive layer formed on the oxide semiconductor layer and the second insulating layer, the second conductive layer including a second conductive pattern that includes a metal layer or an alloy layer sandwiched between conductive oxide layers;
• a transparent resin layer formed on the second conductive pattern;
• a light-absorbing layer formed on the transparent resin layer;
• and
• a first thin film transistor including a first gate electrode, a first source electrode, a first drain electrode, a first channel layer, and a gate insulating layer,
• wherein the black dielectric layer comprises carbon and covers the first conductive pattern and the second conductive pattern in a plan view perpendicular to the first surface,
• the light-absorbing layer comprises carbon and covers the first conductive pattern and the second conductive pattern in a plan view perpendicular to the second surface,
• the first gate electrode is a portion of the first conductive pattern,
• the first source electrode and the first drain electrode are portions of the second conductive pattern,
• the first channel layer is a portion of the oxide semiconductor layer, and
• the gate insulating layer is a portion of the second insulating layer.