# US 11,111,575 B2 · PVD vacuum plating process for aluminum alloy surface

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- Number: US 11,111,575 B2
- Document ID: US11111575B2
- Status: Granted
- Kind: B2
- Application number: 16/724,742
- Filed: 2019-12-23
- Published: 2020-07-30
- Granted: 2021-09-07
- Earliest claimed: 2019-01-27
- Assignees: Foshan Nanhai Jingdingtai Intelligent Technology Co., Ltd
- Applicants: Foshan Nanhai Jingdingtai Intelligent Technology Co., Ltd
- Inventors: Zhongle Yin; Wenqiang Zhao
- Web page: https://patentgrep.com/patent/US11111575B2

## CPC

- C23C 14/022: {by means of bombardment with energetic particles or radiation}
- C23C 14/34: Sputtering
- C23C 14/0641: {Nitrides (C23C14/0617 takes precedence)}
- C23C 14/10: Glass or silica
- C23C 14/325: {Electric arc evaporation}
- C23C 28/04: only coatings of inorganic non-metallic material
- C23C 28/048: {with layers graded in composition or physical properties}
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)

## Abstract

A PVD vacuum plating process for an aluminum alloy surface is provided. The process includes forming a bottom layer: bombarding with an arc power supply, with a bias voltage being controlled at 200-300 V, and the time being controlled at 3-5 minutes; forming an intermediate multi-layer: conducting multilayer transition with an oxide and a nitride, with the number of layers being controlled at 8-10, the time for an individual layer being controlled at 10-20 minutes, and a target current being controlled at 10-20 A. The process also includes forming a transitional engagement layer: conducting mixed sputtering of a transition layer and a color layer for the time of 15-25 minutes; forming the color layer: controlling the time for the color layer at 20-30 minutes; and forming a protective layer: using a high-frequency and large-energy power supply with the time controlled at 40-50 minutes, the process thereby eliminating water plating steps.

## Claims

### Claim 1

A PVD vacuum plating process for an aluminum alloy surface, comprising:
forming a bottom layer by utilizing an arc power supply, with a bias voltage being controlled at 200-300 V, and a time being controlled at 3-5 minutes;
forming an intermediate multi-layer with an oxide and a nitride, with a number of layers being controlled at 8-10, a time for forming an individual layer being controlled at 10-20 minutes, and a target current being controlled at 10-20 A;
forming a transitional engagement layer by conducting mixed sputtering of a transition layer and a color layer for a time of 15-25 minutes;
forming a layer consisting of the color layer by controlling a time for forming the layer consisting of the color layer at 20-30 minutes; and
forming a protective layer by using a power supply with a time controlled at 40-50 minutes, so as to obtain a PVD layer as the protective layer.

### Claim 2 (depends on 1)

The PVD vacuum plating process of claim 1, wherein for the intermediate multi-layer, the oxide is SiO2; and the nitride is TiN.

### Claim 3 (depends on 1)

The PVD vacuum plating process of claim 1, wherein the power supply for the protective layer is in a range of 70-90 kHz, and at a range of 20-30 kW.

### Claim 4 (depends on 1)

The PVD vacuum plating process of claim 1, wherein the PVD layer has a thickness of 1.5-2.5 μm.

### Claim 5 (depends on 2)

The PVD vacuum plating process of claim 2, wherein the power supply for the protective layer is in a range of 70-90 kHz, and at a range of 20-30 kW, and wherein the PVD layer has a thickness of 1.5-2.5 μm.