Silica-based film-forming composition, method of producing substrate including silica-based film, and additive added to silica-based film-forming composition

Abstract

To provide a silica-based film-forming composition, which can form a homogeneous silica-based film, a method of producing a substrate including a silica-based film using the composition, and an additive agent to be added to a silica-based film-forming composition. In a silica-based film-forming composition including a polysilazane (A) and a solvent (S), a nitrogen-containing polar organic solvent is included as the solvent (S). In addition, the composition including a polysilazane (A) and a nitrogen-containing polar organic solvent as the solvent (S) is coated onto the surface of a substrate to form a coated film, which is then baked to produce a substrate including a silica-based film.

Dependencies are inferred from the claim text.