Block copolymer containing photo-sensitive moiety
AssigneeLG Chem, Ltd.
InventorsNo Jin Park, Jin Kon Kim, Chung Ryong Choi, Sung Soo Yoon
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Abstract
The present application may provide a block copolymer and a use thereof. The present application may provide a block copolymer and a use thereof. The block copolymer of the present application may have excellent self-assembly properties or phase separation characteristics and simultaneously have characteristics capable of changing the self-assembly structure formed once, or provide a block copolymer capable of forming a pattern of phase separation structures in a polymer membrane.
Claims13
A block copolymer comprising a first polymer segment, a second polymer segment and a third polymer segment, wherein the block copolymer has a star-like structure that the first, second and third polymer segments are covalently bonded to one connecting point while sharing the connecting point, and the block copolymer has a cleavable linker,
- wherein two polymer segments of the first to third polymer segments are identical to each other and the other polymer segment is different from the two polymer segments,
- wherein one of the two polymer segments identical to each other is linked to the connecting point by the cleavable linker, and
- wherein the cleavable linker is cleavable only by heat or light.
Dependencies are inferred from the claim text.