# US 11,110,496 B2 · Nano composite structure with nano patterned structure on its surface and method of producing the same > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,110,496 B2 - Document ID: US11110496B2 - Status: Granted - Kind: B2 - Application number: 16/724,380 - Filed: 2019-12-23 - Published: 2020-05-07 - Granted: 2021-09-07 - Earliest claimed: 2014-03-17 - Assignees: Korea Institute of Science and Technology - Applicants: Korea Institute of Science and Technology - Inventors: Myoung Woon Moon; Tae Jun Ko; Kyu Hwan Oh - Web page: https://patentgrep.com/patent/US11110496B2 ## CPC - B08B 17/065: {the surface having a microscopic surface pattern to achieve the same effect as a lotus flower} - B81C 1/00206: {Processes for functionalising a surface, e.g. provide the surface with specific mechanical, chemical or biological properties} - B81B 2207/056: of static structures - Y10T 428/24479: including variation in thickness - B08B: CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL - B81C: PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS (making microcapsules or microballoons B01J13/02; processes or apparatus specially adapted for the manufacture or treatment of piezoelectric, electrostrictive or magnetostrictive elements per se H10N30/01) - B81B: MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES (piezoelectric, electrostrictive or magnetostrictive elements per se H10N30/00, H10N35/00) - Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION ## Abstract Provided are a method of producing a nano composite structure and a nano composite structure produced by using the same. The method comprises producing a substrate; placing a metal net structure above the substrate; and plasma treating the substrate above which the metal net structure is placed. The nano composite structure includes a substrate having a plurality of first protrusions constituting a nano pattern on its surface; and an inorganic particle disposed on an end of at least a portion of the first protrusions. ## Claims ### Claim 1 A method of producing a nano composite structure comprising: providing a substrate; placing a metal net structure above the substrate; and plasma treating the substrate above which the metal net structure is placed, wherein the plasma treating comprises depositing a metal or metal oxide particle disposed from the metal net structure on the surface of the substrate through the plasma treatment; and etching residual portions other than portions on which the metal net structure is placed in contact with the substrate, or the metal or metal oxide particles are deposited from the surface of the substrate through the plasma treatment. ### Claim 2 (depends on 1) The method of claim 1, wherein the substrate comprises at least one selected from a plastic, a fiber, a glass, a metal, a ceramic, and a carbon-based material. ### Claim 3 (depends on 2) The method of claim 2, wherein the plastic comprises at least one selected from a polypropylene, polyethylene terephthalate, polystyrene, polymethyl methacrylate, polyvinylidene fluoride, polytetrafluoroethylene, and a copolymer thereof. ### Claim 4 (depends on 2) The method of claim 2, wherein the fiber comprises a natural fiber, synthetic fiber, or a combination thereof. ### Claim 5 (depends on 2) The method of claim 2, wherein the carbon-based material comprises at least one selected from graphite, carbon fiber, diamond, and graphene. ### Claim 6 (depends on 2) The method of claim 2, wherein the metal net structure comprises at least one selected from Ti, Cu, Au, Ag, Cr, Pt, Fe, Al, Si, an alloy thereof, and an oxide thereof. ### Claim 7 (depends on 1) The method of claim 1, wherein the metal net structure is placed above the substrate with a gap of about 0 to about 10 mm. ### Claim 8 (depends on 1) The method of claim 1, wherein the metal net structure comprises metal wires, wherein adjacent wires are spaced apart from each other with a gap of about 10 μm to about 500 μm. ### Claim 9 (depends on 1) The method of claim 1, wherein the depositing and the etching are simultaneously performed under the same plasma treatment conditions. ### Claim 10 (depends on 1) The method of claim 1, wherein the plasma treating is performed in the presence of at least one gas selected from O2, CF4, Ar, N2, and H2. ### Claim 11 (depends on 1) The method of claim 1, wherein the plasma treating is performed in a voltage range of about −100 V to about-1000 V, at a pressure of about 1 to about 1000 mTorr, for about 10 seconds to about 5 hours. ### Claim 12 (depends on 1) The method of claim 1, wherein the metal net structure comprises Ti and the plasma treating is performed by using O2 gas to provide superhydrophilicity to a surface of the nano composite structure. ### Claim 13 (depends on 1) The method of claim 1, wherein the method further comprises, removing the metal net structure and forming a hydrophobic thin film on a surface of the substrate after plasma treating. ### Claim 14 (depends on 13) The method of claim 13, wherein the hydrophobic thin film comprises a fluorine thin film, a fluorine-containing carbonaceous thin film, an organic hydrogenation silicon thin film, or a combination thereof. ### Claim 15 (depends on 13) The method of claim 13, wherein the hydrophobic thin film comprises hexamethyldisiloxane.