Gas distribution plate for thermal deposition
AssigneeApplied Materials, Inc.
InventorsJared Ahmad Lee, Sanjeev Baluja, Joseph AuBuchon, Dhritiman Subha Kashyap, Michael Rice
Life of this patent
Estimating the term…
Abstract
Apparatus and methods for providing high velocity gas flow showerheads for deposition chambers are described. The showerhead has a faceplate in contact with a backing plate that has a concave portion to provide a plenum between the backing plate and the faceplate. A plurality of thermal elements is within the concave portion of the backing plate and extends to contact the faceplate.
Claims20
A gas distribution plate comprising:
- a faceplate having a front surface and a back surface defining a thickness and a plurality of apertures extending through the thickness;
- and a backing plate having a front surface and a back surface defining a thickness, the front surface in contact with the back surface of the faceplate, the front surface of the backing plate including a concave portion to form a plenum bounded by the concave portion and the back surface of the faceplate, and a plurality of thermal elements extending from the concave portion and contacting the back surface of the faceplate.
A method of processing a substrate, the method comprising controlling a temperature of a gas distribution plate having a faceplate with a front surface and a back surface defining a thickness and a plurality of apertures extending through the thickness, and a backing plate having a front surface and a back surface defining a thickness, the front surface in contact with the back surface of the faceplate, the front surface of the backing plate including a concave portion to form a plenum bounded by the concave portion and the back surface of the faceplate, and a plurality of thermal elements extending from the concave portion and contacting the back surface of the faceplate;
- and flowing a gas into the plenum in the gas distribution plate.
A non-transitory computer readable medium including instructions, that, when executed by a controller of a processing chamber, cause the processing chamber to perform operations of:
- controlling a temperature of a gas distribution plate having a faceplate with a front surface and a back surface defining a thickness and a plurality of apertures extending through the thickness, and a backing plate having a front surface and a back surface defining a thickness, the front surface in contact with the back surface of the faceplate, the front surface of the backing plate including a concave portion to form a plenum bounded by the concave portion and the back surface of the faceplate, and a plurality of thermal elements extending from the concave portion and contacting the back surface of the faceplate;
- and controlling a flow of gas into the plenum of the gas distribution plate.
Dependencies are inferred from the claim text.