Member for semiconductor device

A member for semiconductor device, comprising:

• a metal portion configured to be bonded to another member by solder, the metal portion including an insulating plate, a circuit plate deposited on one surface of the insulating plate, and a metal plate deposited on another surface of the insulating plate, and
• a treated coating completely covering surfaces of the metal portion device and reducing chemical alteration on the surfaces of the metal portion, the treated coating including a treatment agent comprising at least one organic substance selected from a metal salt of carboxylic acid and a carboxylic acid ester,
• wherein the treated coating vaporizes at a temperature lower than or equal to a solidus temperature of the solder, so that the treated coating finishes vaporization during a temperature elevation and after onset of melting of the solder, the treated coating does not remain on the surfaces of the member for semiconductor device,
• wherein the at least one organic substance is selected from a metal salt of fatty acid, and a fatty acid ester, and
• wherein the organic substance is an alkaline metal salt including potassium salt and sodium salt of the carboxylic acid, the carboxylic acid including one of formic acid, acetic acid, propanoic acid, butanoic acid, pentanoic acid, hexanoic acid, heptanoic acid, octanoic acid, nonanoic acid, decanoic acid, undecanoic acid, dodecanoic acid, tridecanoic acid, tetradecanoic acid, pentadecanoic acid, hexadecanoic acid, heptadecanoic acid, octadecanoic acid, nonadecanoic acid, icosanoic acid, propenoic acid, butenoic acid, pentenoic acid, hexenoic acid, heptenoic acid, octenoic acid, nonenoic acid, decenoic acid, undecenoic acid, dodecenoic acid, tridecenoic acid, tetradecenoic acid, pentadecenoic acid, hexadecenoic acid, heptadecenoic acid, octadecenoic acid, nonadecenoic acid, icosenoic acid, 2-ethylhexanoic acid, oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, undecanedioic acid, dodecanedioic acid, tridecanedioic acid, tetradecanedioic acid, pentadecanedioic acid, hexadecanedioic acid, heptadecanedioic acid, phthalic acid, isophthalic acid, terephthalic acid, malic acid, and citric acid, or
• an ester compound of the carboxylic acid including one of formic acid, acetic acid, propanoic acid, butanoic acid, pentanoic acid, hexanoic acid, heptanoic acid, octanoic acid, nonanoic acid, decanoic acid, undecanoic acid, dodecanoic acid, tridecanoic acid, tetradecanoic acid, pentadecanoic acid, hexadecanoic acid, heptadecanoic acid, octadecanoic acid, nonadecanoic acid, icosanoic acid, propenoic acid, butenoic acid, pentenoic acid, hexenoic acid, heptenoic acid, octenoic acid, nonenoic acid, decenoic acid, undecenoic acid, dodecenoic acid, tridecenoic acid, tetradecenoic acid, pentadecenoic acid, hexadecenoic acid, heptadecenoic acid, octadecenoic acid, nonadecenoic acid, icosenoic acid, 2-ethylhexanoic acid, oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, undecanedioic acid, dodecanedioic acid, tridecanedioic acid, tetradecanedioic acid, pentadecanedioic acid, hexadecanedioic acid, heptadecanedioic acid, phthalic acid, isophthalic acid, terephthalic acid, malic acid, and citric acid.