Back to results
US 11,107,785 B2Granted
Semiconductor device with a plurality of landing pads and method for fabricating the same
AssigneeNanya Technology Corporation
InventorPing Hsu
Life of this patent
Estimating the term…
Abstract
The present application discloses a semiconductor device and a method for fabricating the semiconductor device. The semiconductor device includes a substrate, a plurality of conductive features positioned above the substrate, a plurality of landing pads positioned above the substrate, a coverage layer positioned above the substrate, and a plurality of capacitor structures positioned above the substrate. An angle between the axes of two adjacent landing pads is less than 180 degrees.
Claims20
A semiconductor device, comprising:
- a substrate, including a plurality of active regions;
- a plurality of conductive features positioned above the substrate in each of the plurality of active regions;
- a plurality of landing pads positioned above the substrate in each of the plurality of active regions, wherein each of the plurality of landing pads includes an extending axis parallel to a top surface of the substrate, wherein an angle between the extending axes of two adjacent landing pads in each of the plurality of active regions is less than 180 degrees;
- a coverage layer positioned above the substrate in each of the plurality of active regions;
- and
- a plurality of capacitor structures positioned above the substrate.
3 more elements
A method for fabricating a semiconductor device, comprising:
- providing a substrate and defining a plurality of active regions in the substrate;
- forming a plurality of conductive features positioned above the substrate in each of the plurality of active regions;
- forming a coverage layer positioned above the substrate in each of the plurality of active regions;
- and,
- forming a plurality of landing pads positioned above the substrate in each of the plurality of active regions, wherein each of the plurality of landing pads includes an extending axis parallel to a top surface of the substrate, wherein an angle between the extending axes of two adjacent landing pads in each of the plurality of active regions is less than 180 degrees.
2 more elements
Dependencies are inferred from the claim text.