Back to results
US 11,107,665 B2Granted
Feeding structure, upper electrode assembly, and physical vapor deposition chamber and device
AssigneeBeijing Naura Microelectronics Equipment Co., Ltd.
InventorsYuchun Deng, Chao Zhang, Peng Chen, Guoqing Qiu, Mengxin Zhao
Life of this patent
Estimating the term…
Abstract
The present disclosure provides a feeding structure, an upper electrode assembly, and a physical vapor deposition chamber and device. In the present disclosure a RF power is fed through the center of a first introduction member of the feeding structure and is evenly distributed onto a target by a plurality of distribution members.
Claims20
A feeding structure for a physical vapor deposition device, comprising:
- a first introduction member configured to receive power;
- a second introduction member including a plurality of holes and coupled to the first introduction member;
- a plurality of distribution members evenly distributed around an axis of the first introduction member;
- and
- an introduction ring and an export ring;
- wherein:
- all sizes of a portion of the plurality of holes along a radial direction increase with distances between the portion of the holes and the axis of the first introduction member;
- and
- one end of each distribution member is coupled, through the introduction ring, to the second introduction member at a periphery of the second introduction member, and the other end of each distribution member is coupled to a target through the export ring and configured to provide power to the target.
6 more elements
An upper electrode assembly, comprising:
- a feeding structure comprising a first introduction member configured to receive power;
- a second introduction member including a plurality of holes and coupled to the first introduction member;
- a plurality of distribution members evenly distributed around an axis of the first introduction member;
- and an introduction ring and an export ring;
- and
- wherein:
- all sizes of a portion of the plurality of holes along a radial direction increase with distances between the portion of the holes and the axis of the first introduction member;
- and
- one end of each distribution member is coupled, through the introduction ring, to the second introduction member at a periphery of the second introduction member, and the other end of each distribution member is coupled to a target through the export ring and configured to provide power to the target;
- a radio frequency (RF) power supply or a direct current (DC) power supply coupled to the first introduction member.
7 more elements
A physical vapor deposition chamber, comprising:
- a chamber body;
- and
- an upper electrode assembly disposed on top of the chamber body, the upper electrode assembly comprising a feeding structure comprising a first introduction member configured to receive power;
- a second introduction member including a plurality of holes and coupled to the first introduction member;
- a plurality of distribution members evenly distributed around an axis of the first introduction member;
- and an introduction ring and an export ring;
- and a radio frequency (RF) power supply or a direct current (DC) power supply coupled to the first introduction member;
- wherein:
- all sizes of a portion of the plurality of holes along a radial direction increase with distances between the portion of the holes and the axis of the first introduction member;
- and
- one end of each distribution member is coupled, through the introduction ring, to the second introduction member at a periphery of the second introduction member, and the other end of each distribution member is coupled to a target through the export ring and configured to provide power to the target.
8 more elements
A physical vapor deposition device, comprising:
- a physical vapor disposition chamber comprising a chamber body;
- and
- an upper electrode assembly disposed on top of the chamber body, the upper electrode assembly comprising a feeding structure including a first introduction member configured to receive power;
- a second introduction member including a plurality of holes and coupled to the first introduction member;
- a plurality of distribution members evenly distributed around an axis of the first introduction member;
- and an introduction ring and export ring;
- and a radio frequency (RF) power supply or a direct current (DC) power supply coupled to the first introduction member;
- wherein:
- all sizes of a portion of the plurality of holes along a radial direction increase with distances between the portion of the holes and the axis of the first introduction member;
- and
- one end of each distribution member is coupled, through the introduction ring, to the second introduction member at a periphery of the second introduction member, and the other end of each distribution member is coupled to a target through the export ring and configured to provide power to the target.
8 more elements
Dependencies are inferred from the claim text.