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US 11,103,892 B1Granted
Initiated chemical vapor deposition method for forming nanovoided polymers
AssigneeFacebook Technologies, LLC
InventorsChristopher Yuan Ting Liao, Andrew John Ouderkirk
Life of this patent
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Abstract
An initiated chemical vapor deposition (i-CVD) method for forming a nanovoided polymeric material may include heating a mixture including a gaseous monomer, a gaseous polymerization initiator, and a solvent to form a polymeric thin film including the solvent and removing the solvent from the polymeric thin film to form a nanovoided thin film. Devices, including dielectric elastomer actuators, may be formed using the nanovoided polymeric material. Various other methods, systems, apparatuses, and materials are also disclosed.
Claims20
A method comprising:
- introducing a mixture comprising a gaseous polymerization initiator, a gaseous monomer, and a solvent into a reaction chamber;
- forming free-radicals of the gaseous polymerization initiator;
- contacting a substrate within the reaction chamber with the free-radicals, the gaseous monomer, and the solvent to form a polymeric thin film on the substrate,
- wherein the solvent forms liquid inclusions within the polymeric thin film;
- and
- removing at least a portion of the solvent from the polymeric thin film to form a nanovoided polymeric thin film on the substrate.
3 more elements
A method comprising:
- heating a mixture comprising a gaseous polymerization initiator, a gaseous monomer, and a solvent to form a polymeric thin film comprising the solvent,
- wherein the solvent forms liquid inclusions within the polymeric thin film;
- and
- removing the solvent from the polymeric thin film to form a nanovoided polymeric thin film.
1 more element
A method comprising:
- heating a mixture comprising a gaseous polymerization initiator, a gaseous monomer, and a solvent within a reaction chamber to form a polymeric thin film on a substrate, wherein the polymeric thin film comprises the solvent and the solvent forms liquid inclusions within the polymeric thin film;
- and
- heating the substrate to remove the solvent from the polymeric thin film to form a nanovoided polymeric thin film.
Dependencies are inferred from the claim text.