Support table for a lithographic apparatus, method of loading a substrate, lithographic apparatus and device manufacturing method

A support table for a lithographic apparatus, the support table configured to support a substrate, wherein the support table comprises:

• a base surface;
• a plurality of burls protruding from the base surface, each of the plurality of burls having a respective distal end, the plurality of burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal ends of the plurality of burls;
• a plurality of protrusions protruding from the base surface, each of the plurality of protrusions having a respective distal end, the respective distal end of each protrusion configured such that, when the substrate is supported by the respective distal ends of the plurality of burls, the respective distal end of each protrusion is spaced apart from the substrate;
• and
• a gas channel formed in each protrusion of the plurality of protrusions, each gas channel configured to allow a flow of gas to be supplied through the respective protrusion to an opening in the distal end of the respective protrusion,
• wherein a separation between the substrate and the distal end of at least one of the protrusions, when the substrate is supported by the support table, is less than 10% of a height of one or more of the burls.

A support table for a lithographic apparatus, the support table configured to support a substrate, wherein the support table comprises:

• a base surface, the base surface facing a surface of the substrate when the substrate is supported by the support table;
• and
• a plurality of gas cushion members, each of the gas cushion members configured to provide a localized gas cushioning effect during a moving of the substrate into a position on the support table at which the substrate is supported by the support table,
• wherein a gas cushion member of the gas cushion members comprises:
• an opening defined by a distal rim that is closest to the substrate when the substrate is supported by the support table;
• and
• a gas channel in one or more walls forming the opening, the gas channel configured to open into a portion of the gas cushion member, the gas channel configured to allow a gas flow into or out of the portion of the gas cushion member while the substrate is being moved onto the support table, thereby providing an adjustment of the localized gas cushioning effect provided by the gas cushion member.