Electrophotographic photosensitive member, process cartridge, and image forming apparatus
AssigneeKYOCERA Document Solutions Inc.
InventorTomofumi Shimizu
Life of this patent
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Abstract
A single-layer photosensitive layer of an electrophotographic photosensitive member contains a charge generating material, a hole transport material, an electron transport material, and a binder resin. The charge generating material is a phthalocyanine pigment. A content percentage of the phthalocyanine pigment relative to the mass of the photosensitive layer is at least 0.70% by mass and no greater than 1.40% by mass. A film thickness of the photosensitive layer is at least 25 μm and no greater than 32 μm. A charge amount difference ΔQ is no greater than 6.50 μC.
Claims12
An electrophotographic photosensitive member comprising a conductive substrate and a photosensitive layer, wherein
- the photosensitive layer is a single-layer photosensitive layer,
- the photosensitive layer contains a charge generating material, a hole transport material, an electron transport material, and a binder resin,
- the charge generating material is a phthalocyanine pigment,
- a content percentage of the phthalocyanine pigment relative to a mass of the photosensitive layer is at least 0.70% by mass and no greater than 0.92% by mass,
- the hole transport material is represented by a chemical formula (HTM-1) or (HTM-2),
- a film thickness of the photosensitive layer is at least 28 μm and no greater than 32 μm,
- a charge amount difference ΔQ of a surface of the photosensitive layer is no greater than 6.50 μC, and
- the charge amount difference ΔQ is calculated based on a mathematical expression (1)
- ΔQ=Q1−Q2 (1)
- where in mathematical expression (1), Q1 represents a charge amount of a non-exposed region of the surface of the photosensitive layer, Q2 represents a charge amount of an exposed region of the surface of the photosensitive layer, the exposed region is a region of the surface of the photosensitive layer charged to +600 V and then irradiated with exposure light having a wavelength of 780 nm and an exposure amount of 1.2 μJ/cm2, and the non-exposed region is a region of the surface of the photosensitive layer charged to +600 V and not irradiated with the exposure light thereafter
Dependencies are inferred from the claim text.