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AssigneeDexerials Corporation
InventorsYutaka Muramoto, Masanao Kikuchi, Shunichi Kajiya, Takaaki Otowa, Yasuhiro Takahashi
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Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.
A cylindrical base comprising a quartz glass in a cylindrical shape, wherein the cylindrical base has an internal strain in terms of birefringence of less than 20 nm/cm, waviness on an external circumference surface thereof having a period of 10 mm or less in the circumferential direction has an amplitude of 50 nm or less, an outer diameter of between 50 and 300 mm, a thickness of between 2 and 50 mm and a uniform distribution of reflected light intensity.
Dependencies are inferred from the claim text.