US 11,081,680 B2Granted

Pixel structure, method for forming the same, and display screen

AssigneeSeeya Optronics Co., Ltd.

InventorsYuhan Ju, Tieer Gu, Jie Kong

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Abstract

A pixel structure, a method for forming the pixel structure, and a display screen are provided. The method includes: providing a substrate for forming an OLED device, the substrate having a first pixel area, a second pixel area, and a third pixel area; and forming a compensation layer on the substrate, the compensation layer having different thicknesses in the first pixel area, the second pixel area, and the third pixel area. In the present disclosure, the compensation layer is formed on the substrate, and the compensation layer has different thicknesses respectively in the first pixel area, the second pixel area and the third pixel area, so that the cavity of the first pixel area, the cavity of the second pixel area, and the cavity of the third pixel area can be individually controlled.

Claims18

Dependent claims

A method for forming a pixel structure, comprising:

providing a substrate for forming an OLED device, wherein the substrate has a first pixel area, a second pixel area, and a third pixel area;
forming an anode layer on the substrate;
forming a first compensation material layer, a second compensation material layer, and a third compensation material layer on a part of the anode layer in the first pixel area;
forming the first compensation material layer and the second compensation material layer on a part of the anode layer in the second pixel area;
and
forming the first compensation material layer on a part of the anode layer in the third pixel area,
wherein the first compensation material layer, the second compensation material layer, and the third compensation material layer in the first pixel area constitute a part of a compensation layer in the first pixel area;
the first compensation material layer and the second compensation material layer in the second pixel area constitute a part of the compensation layer in the second pixel area;
and the first compensation material layer in the third pixel area constitutes a part of the compensation layer in the third pixel area;
wherein forming the first compensation material layer, the second compensation material layer, and the third compensation material layer comprises:
forming the first compensation material layer on the anode layer,
forming the second compensation material layer on the first compensation material layer,
removing the second compensation material layer in the third pixel area,
forming the third compensation material layer on the second compensation material layer in the first pixel area and the second pixel area, and on the first compensation material layer in the third pixel area, and
removing the third compensation material layer in the second pixel area and the third pixel area;
and
wherein said forming the second compensation material layer comprises:
forming a first sacrifice layer on the first compensation material layer in the third pixel area;
and
forming the second compensation material layer covering the first compensation material layer in the first pixel area, the second pixel area, and the first sacrifice layer.

17 more elements

A method for forming a pixel structure, comprising:

providing a substrate for forming an OLED device, wherein the substrate has a first pixel area, a second pixel area, and a third pixel area;
forming an anode layer on the substrate;
forming a first compensation material layer, a second compensation material layer, and a third compensation material layer on a part of the anode layer in the first pixel area;
forming the first compensation material layer and the second compensation material layer on a part of the anode layer in the second pixel area;
and
forming the first compensation material layer on a part of the anode layer in the third pixel area,
wherein the first compensation material layer, the second compensation material layer, and the third compensation material layer in the first pixel area constitute a part of a compensation layer in the first pixel area;
the first compensation material layer and the second compensation material layer in the second pixel area constitute a part of the compensation layer in the second pixel area;
and the first compensation material layer in the third pixel area constitutes a part of the compensation layer in the third pixel area;
and
wherein forming the first compensation material layer, the second compensation material layer, and the third compensation material layer comprises:
forming the first compensation material layer on the anode layer;
forming the second compensation material layer on the first compensation material layer;
forming the third compensation material layer on the second compensation material layer, wherein the third compensation material layer is formed on a part of the second material that is formed in the third pixel area;
removing the third compensation material layer in the third pixel area and the second compensation material layer in the third pixel area;
and
removing the third compensation material layer in the second pixel area,
wherein the first compensation material layer, the second compensation material layer, and the third compensation material layer in the first pixel area constitute the part of the compensation layer in the first pixel area;
the first compensation material layer and the second compensation material layer in the second pixel area constitute the part of the compensation layer in the second pixel area;
and the first compensation material layer in the third pixel area constitutes the part of the compensation layer in the third pixel area.

17 more elements

Dependencies are inferred from the claim text.

Facts

Application: 16/729,814Filed 30 Dec 2019 · continuation
Priority: CN 201710669365.78 Aug 2017
Published: US 2020/0136095 A130 Apr 2020
Granted: 3 Aug 2021
Term ends: Not estimatedThe source records don’t support an estimate.

Classification14 codes

H10K 59/30
Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00: devices…
H10K 50/125
Characterised by the electroluminescent [EL] layers: specially adapted for multicolour light emission, e.g. for emitting white light
H10K 59/121
Active-matrix OLED [AMOLED] displays: characterised by the geometry or disposition of pixel elements
H10K 59/131
Active-matrix OLED [AMOLED] displays: interconnections, e.g. wiring lines or terminals