Structure and formation method of semiconductor device structure with a dummy fin structure
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsLung Chen, Kang-Min Kuo, Wen-Hsin Chan
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Abstract
Structures and formation methods of a semiconductor device structure are provided. The method includes forming a dummy fin structure, and forming a mask layer covering the dummy fin structure. The method also includes removing a portion of the mask layer and a top portion of the dummy fin structure by a first etching operation to form an etched mask layer, wherein the dummy fin structure has a protruding portion protruding from a top surface of the etched mask layer after the first etching operation.
Claims20
A method for forming a semiconductor device structure, comprising:
- forming a dummy fin structure;
- forming a mask layer covering the dummy fin structure;
- and
- removing a portion of the mask layer and a top portion of the dummy fin structure by a first etching operation to form an etched mask layer, wherein the dummy fin structure has a protruding portion protruding from a top surface of the etched mask layer after the first etching operation.
A method for forming a semiconductor device structure, comprising:
- forming a fin structure and a dummy fin structure;
- forming a hard mask layer over the fin structure and the dummy fin structure;
- forming a mask layer over the hard mask layer;
- and
- removing a portion of the mask layer, a portion of the hard mask layer and a top portion of the dummy fin structure, such that another portion of the hard mask layer remains on the dummy fin structure.
A method for forming a semiconductor device structure, comprising:
- forming a fin structure and a dummy fin structure;
- forming a mask layer covering the fin structure;
- and
- forming a concave or convex top surface on the dummy fin structure by removing a top portion of the dummy fin structure,
- wherein the concave top surface has a smooth top surface that curves inwards, or the convex top surface has a smooth top surface that curves outwards.
Dependencies are inferred from the claim text.