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US 11,081,514 B2Granted
Image sensors and methods of forming the same
AssigneeSamsung Electronics Co., Ltd.
InventorYun Ki Lee
Life of this patent
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Abstract
An image sensor includes a substrate including a light-receiving region and a light-shielding region, a device isolation pattern in the substrate of the light-receiving region to define active pixels, and a device isolation region in the substrate of the light-shielding region to define reference pixels. An isolation technique of the device isolation pattern is different from that of the device isolation region.
Claims20
An image sensor comprising:
- a substrate including an active region and an edge region in a plan view, the substrate having a first surface and a second surface opposite to the first surface;
- micro-lenses on the first surface of the active region of the substrate, wherein the micro-lenses are not disposed on the edge region of the substrate;
- an anti-reflection layer disposed on the first surface of the active region and the edge region of the substrate;
- color filters between the anti-reflection layer and the micro-lenses;
- a grid pattern between adjacent two of the color filters;
- a plurality of photoelectric conversion parts between the first and second surfaces of the substrate;
- a gate pattern on the second surface of the substrate;
- an interconnection structure provided on the active region and the edge region of the substrate and covering the gate pattern, the interconnection structure comprising insulating layers stacked on the second surface of the substrate and interconnections in the insulating layers;
- first isolation patterns between the plurality of photoelectric conversion parts in the active region of the substrate;
- and
- second isolation patterns in the edge region of the substrate,
- wherein a depth of the first isolation patterns is different from a depth of the second isolation patterns,
- wherein adjacent two of the first isolation patterns are separated by a first distance that is less than a second distance separating adjacent two of the second isolation patterns, and
- wherein the first isolation patterns include a different material from the second isolation patterns.
11 more elements
An image sensor comprising:
- a substrate including an active region and an edge region in a plan view, the substrate having a first surface and a second surface opposite to the first surface;
- a plurality of photoelectric conversion parts between the first and second surfaces in the active region of the substrate;
- first isolation patterns between the plurality of photoelectric conversion parts in the active region of the substrate;
- second isolation patterns in the edge region of the substrate;
- and
- a micro-lens array on the first surface of the active region of the substrate,
- wherein the micro-lens array is not disposed on the edge region of the substrate,
- wherein a shape of the first isolation patterns is different from a shape of the second isolation patterns, and
- wherein adjacent two of the first isolation patterns are separated by a first distance that is less than a second distance separating adjacent two of the second isolation patterns.
6 more elements
An image sensor comprising:
- a substrate including an active region and an edge region in a plan view;
- a plurality of photoelectric conversion parts provided between a first surface of the substrate and a second surface of the substrate in the active region of the substrate;
- a pixel isolation pattern between the plurality of photoelectric conversion parts in the active region of the substrate;
- a device isolation pattern in the edge region of the substrate;
- micro-lenses provided on the first surface of the active region of the substrate and spaced apart from the edge region of the substrate;
- color filters between the substrate and the micro-lenses;
- and
- a grid pattern between adjacent two of the color filters, the adjacent two of the color filters spaced apart by the grid pattern,
- wherein a depth of the pixel isolation pattern is different from a depth of the device isolation pattern, and
- wherein the pixel isolation pattern includes a different material from the device isolation pattern.
7 more elements
Dependencies are inferred from the claim text.