Imaging element, manufacturing method of imaging element, metal thin film filter, and electronic device

An imaging device, comprising:

• a filter layer configured to selectively filter incident light according to wavelengths of the light;
• and
• a photoelectric conversion layer configured to receive light filtered by the filter layer and to produce an electric charge in response to the received light,
• wherein the filter layer includes:
• a first filter region corresponding to a first pixel of the imaging device, the first filter region having a first thickness and a plurality of through holes formed therein, wherein the first filter region transmits light incident on the first filter region with a first peak transmission wavelength;
• and
• a second filter region corresponding to a second pixel of the imaging device, the second filter region having a second thickness greater than the first thickness and having a plurality of through holes formed therein, wherein the second filter region transmits light incident on the second filter region with a second peak transmission wavelength that is greater than the first peak transmission wavelength.