Fabrication of vertical fin field effect transistors having top air spacers and a self aligned top junction
AssigneeInternational Business Machines Corporation
InventorsKangguo Cheng, Xin Miao, Wenyu Xu, Chen Zhang
Life of this patent
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Abstract
A method of fabricating adjacent vertical fins with top source/drains having an air spacer and a self-aligned top junction, including, forming two or more vertical fins on a bottom source/drain, forming a top source/drain on each of the two or more vertical fins, wherein the top source/drains are formed to a size that leaves a gap between the adjacent vertical fins, and forming a source/drain liner on the top source/drains, where the source/drain liner occludes the gap between adjacent top source/drains to form a void space between adjacent vertical fins.
Claims20
A semiconductor device, comprising:
- at least two vertical fins on a first region of a substrate;
- at least two vertical fins on a second region of the substrate adjacent to the first region, wherein the distance between an adjacent pair of the vertical fins on the second region is greater than the distance between an adjacent pair of the vertical fins on the first region of the substrate;
- a top source/drain on each of the at least two vertical fins on the first region, wherein the top source/drains are separated by a first gap;
- a top source/drain on each of the at least two vertical fins on the second region, wherein the top source/drains on the second region are larger than the top source/drains on the at least two vertical fins on the first region, and wherein the top source/drains are separated by a second gap;
- and
- a source/drain liner on the top source/drains on the first region and the second region, wherein the source/drain liner forms liner plugs that occlude the first and second gaps between the top source/drains to form a void space between the at least two vertical fins on the first region, and between the at least two vertical fins on the second region.
A plurality of vertical fin devices with top air spacers and a self-aligned top junction, comprising:
- a first bottom source/drain and a second bottom source/drain on a substrate;
- at least two vertical fins on the first bottom source/drain;
- at least two vertical fins on the second bottom source/drain;
- a top source/drain on each of the at least two vertical fins on the first bottom source/drain, wherein the top source/drains are separated by a first gap;
- a top source/drain on each of the at least two vertical fins on the second bottom source/drain, wherein the top source/drains are separated by a second gap having about the same size as the first gap between the top source/drains on the at least two vertical fins on the first bottom source/drain;
- and
- a source/drain liner on the at least four top source/drains, wherein the source/drain liner forms liner plugs that occlude the first and second gaps between the top source/drains to form a void space between the at least two vertical fins on the first bottom source/drain, and between the at least two vertical fins on the second bottom source/drain.
A plurality of vertical fin devices with top air spacers and a self-aligned top junction, comprising:
- a first bottom source/drain and a second bottom source/drain on a substrate, wherein the first bottom source/drain is separated from the second bottom source/drain by an isolation region in the substrate filled with an isolation region material;
- at least two vertical fins on the first bottom source/drain;
- at least two vertical fins on the second bottom source/drain;
- a gate structure on each of the at least four vertical fins;
- a top source/drain on the at least two vertical fins on the first bottom source/drain, wherein the top source/drains are separated by a first gap;
- a top source/drain on the at least two vertical fins on the second bottom source/drain, wherein the top source/drains are separated by a second gap having about the same size as the first gap between the top source/drains on the at least two vertical fins on the first bottom source/drain;
- and
- a source/drain liner on the at least four top source/drains, wherein the source/drain liner forms liner plugs that occlude the first and second gaps between the top source/drains to form a void space between the at least two vertical fins on the first bottom source/drain, and between the at least two vertical fins on the second bottom source/drain.
Dependencies are inferred from the claim text.