Bonding method with electron-stimulated desorption
AssigneeCommissariat A L'energie Atomique Et Aux Energies Alternatives
InventorsFrank Fournel, Vincent Larrey, Sylvain Maitrejean, Christophe Morales
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Abstract
A method for directly bonding a first and a second substrate. The method comprises removing surface oxide layers from bonding faces of the first and of the second substrate, and hydrogen passivation of the bonding faces, then, in a vacuum, electron impact hydrogen desorption on the bonding faces followed by placement of the bonding faces in intimate contact with one another.
Claims10
A method for directly bonding a first substrate having a first bonding face and a second substrate having a second bonding face, comprising the steps of:
- removing a surface oxide layer from each of the first and second bonding faces;
- hydrogen passivating each of the first and second bonding faces;
- and
- in a vacuum, performing electron impact hydrogen desorption on the each of the first and second bonding faces followed by placing the first and second bonding faces in intimate contact with one another.
Dependencies are inferred from the claim text.