Substrate processing system
AssigneeTokyo Electron Limited
InventorsRyota Goto, Kiyoshi Suzuki
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Abstract
A substrate processing system comprising: a first chamber comprising loading tables, on which a plurality of substrates are to be loaded; a second chamber comprising loading tables, on which a plurality of substrates are to be loaded; a first transfer device comprising a plurality of blades configured to hold a plurality of substrates in a lengthwise direction thereof, and configured to transfer a plurality of substrates loaded on the loading tables of the first chamber to the loading tables of the second chamber with the substrates held at the same height; a substrate sensor provided on paths, along which the blades enter the second chamber, and configured to detect a substrate held by the blades; and a controller configured to control the first transfer device.
Claims16
A substrate processing system comprising:
- a first chamber comprising loading tables, on which a plurality of substrates are to be loaded;
- a second chamber comprising loading tables, on which a plurality of substrates are to be loaded;
- a first transfer device comprising a plurality of blades configured to hold a plurality of substrates in a lengthwise direction thereof, and configured to transfer a plurality of substrates loaded on the loading tables of the first chamber to the loading tables of the second chamber with the substrates held at the same height;
- a substrate sensor provided on paths, along which the blades enter the second chamber, and configured to detect a substrate held by the blades;
- and
- a controller configured to control the first transfer device.
Dependencies are inferred from the claim text.