Substrate cleaning apparatus and substrate cleaning method
AssigneeEbara Corporation
InventorTomoatsu Ishibashi
Life of this patent
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Abstract
According to one embodiment, a substrate cleaning apparatus that cleans a substrate while rotating the substrate, the substrate cleaning apparatus includes: a first cleaning liquid supplier that sprays cleaning liquid in a spray shape at a first spraying angle toward a center of the substrate; and a second cleaning liquid supplier that sprays cleaning liquid in a spray shape at a second spraying angle greater than the first spraying angle toward an area between the center of the substrate and an edge of the substrate.
Claims12
A substrate cleaning apparatus that cleans a substrate while rotating the substrate, the substrate cleaning apparatus comprising:
- a first cleaning liquid supplier that sprays cleaning liquid in a spray shape at a first spraying angle toward a center of the substrate;
- a second cleaning liquid supplier that sprays cleaning liquid in a spray shape at a second spraying angle greater than the first spraying angle toward an area between the center of the substrate and an edge of the substrate, and
- a cleaner that comes into contact with the substrate and cleans the substrate, wherein
- a body of the first cleaning liquid supplier and a body of the second cleaning liquid supplier are parallel such that when viewed from a position above the substrate and the cleaner, a first line is parallel to a second line, wherein the first line connects the first cleaning liquid supplier and a center of a first arrival area of the cleaning liquid sprayed from the first cleaning liquid supplier, the second line connects the second cleaning liquid supplier and a center of a second arrival area of the cleaning liquid sprayed from the second cleaning liquid supplier, and the first line and the second line being substantially perpendicular to a longitudinal direction of the cleaner, and
- the second cleaning liquid supplier sprays cleaning liquid to an area, where the substrate and the cleaner contact with each other where rotational surfaces of the substrate and the cleaner are tangential to each other with respect to the cleaner, each having a corresponding rotational axis orthogonal to each other, and in the second arrival area, a horizontal component of a spraying direction from the second cleaning liquid supplier has an identical direction to a direction of a moving point on the rotational surface of the substrate, and
- wherein the first cleaning liquid supplier and the second cleaning liquid supplier spray cleaning liquid such that the second arrival area is larger than the first arrival area.
Dependencies are inferred from the claim text.