A method of modeling a high speed channel in a semiconductor package, the high speed channel comprising a plurality of first connection wirings on an upper surface of a semiconductor substrate and a plurality of through electrodes that extend within the semiconductor substrate, the method comprising:
- receiving design information of the high speed channel;
- dividing the design information into a first layout comprising the plurality of first connection wirings and a second layout comprising the plurality of through electrodes;
- performing a first modeling operation on the first layout using a first modeling scheme and a first modeling tool;
- performing a second modeling operation on the second layout using a second modeling scheme, a second modeling tool, and at least a portion of the first layout, wherein the second modeling scheme is different from the first modeling scheme, and wherein the second modeling tool is different from the first modeling tool;
- and
- obtaining an integrated modeling result of an entirety of the high speed channel by combining a result of the first modeling operation and a result of the second modeling operation.