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US 11,079,676 B2Granted
Radiation-sensitive composition, pattern-forming method, and metal-containing resin and production method thereof
AssigneeJsr Corporation
InventorsYusuke Asano, Hisashi Nakagawa, Shinya Minegishi
Life of this patent
Estimating the term…
Abstract
A radiation-sensitive composition is to be used in exposure with an extreme ultraviolet ray or an electron beam, and includes a first polymer and a solvent, wherein the first polymer includes a first structural unit including: at least one metal atom; and at least one carbon atom that each bonds to the metal atom by a chemical bond and does not constitute an unsaturated bond, and at least one chemical bond is a covalent bond. Every chemical bond is preferably a covalent bond. The metal atom is preferably tin, germanium, lead or a combination thereof.
Claims23
A radiation-sensitive composition for exposure with an extreme ultraviolet ray or an electron beam, comprising:
- a polymer;
- and
- a solvent dissolving or dispersing the polymer,
- wherein the polymer comprises a structural unit comprising at least one formula selected from the group consisting of
- where M is a metal atom, R1 is a monovalent organic group having 1 to 20 carbon atoms, n is an integer of 1 to 4 such that when n is no less than 2, a plurality of R1s is identical or different, at least one R1 bonds to M via a carbon atom that bonds to the metal atom by a covalent bond and does not constitute an unsaturated bond, L1 and L2 each independently are a divalent linking group having 1 to 30 atoms, R2 is a monovalent organic group having 1 to 20 carbon atoms, m is an integer of 1 to 4 such that when m is no less than 2, a plurality of R2s is identical or different, at least one of L1, L2 and at least one R2 bonds to M via a carbon atom that bonds to the metal atom by a covalent bond and does not constitute an unsaturated bond, RA is a hydrogen atom or a monovalent organic group having 1 to 10 carbon atoms, L3 is a divalent linking group having 1 to 30 atoms, R3 is a monovalent organic group having 1 to 20 carbon atoms, p is an integer of 1 to 5 such that when p is no less than 2, a plurality of R3s is identical or different, and at least one of L3 and at least one R3 bonds to M via a carbon atom that bonds to the metal atom by a covalent bond and does not constitute an unsaturated bond.
2 more elements
A metal-containing resin, comprising:
- a polymer,
- wherein the polymer comprises a structural unit comprising at least one formula selected from the group consisting of
- where M is a metal atom, R1 is a monovalent organic group having 1 to 20 carbon atoms, n is an integer of 1 to 4 such that when n is no less than 2, a plurality of R1s is identical or different, at least one R1 bonds to M via a carbon atom that bonds to the metal atom by a covalent bond and does not constitute an unsaturated bond, L1 and L2 each independently are a divalent linking group having 1 to 30 atoms, R2 is a monovalent organic group having 1 to 20 carbon atoms, in is an integer of 1 to 4 such that when in is no less than 2, a plurality of R2s is identical or different, at least one of L1, L2 and at least one R2 bonds to M via a carbon atom that bonds to the metal atom by a covalent bond and does not constitute an unsaturated bond, RA is a hydrogen atom or a monovalent organic group having 1 to 10 carbon atoms, L3 is a divalent linking group having 1 to 30 atoms, R3 is a monovalent organic group having 1 to 20 carbon atoms, p is an integer of 1 to 5 such that when p is no less than 2, a plurality of R3s is identical or different, and at least one of L3 and at least one R3 bonds to M via a carbon atom that bonds to the metal atom by a covalent bond and does not constitute an unsaturated bond.
A method of producing a metal-containing resin, comprising:
- forming a main chain of a polymer by chain polymerization with a radical, an anion or a cation such that the polymer comprises a structural unit comprising at least one formula selected from the group consisting of
- where M is a metal atom, R1 is a monovalent organic group having 1 to 20 carbon atoms, n is an integer of 1 to 4 such that when n is no less than 2, a plurality of R1s is identical or different, at least one R1 bonds to M via a carbon atom that bonds to the metal atom by a covalent bond and does not constitute an unsaturated bond, L1 and L2 each independently are a divalent linking group having 1 to 30 atoms, R2 is a monovalent organic group having 1 to 20 carbon atoms, m is an integer of 1 to 4 such that when m is no less than 2, a plurality of R2s is identical or different, at least one of L1, L2 and at least one R2 bonds to M via a carbon atom that bonds to the metal atom by a covalent bond and does not constitute an unsaturated bond, RA is a hydrogen atom or a monovalent organic group having 1 to 10 carbon atoms, L3 is a divalent linking group having 1 to 30 atoms, R3 is a monovalent organic group having 1 to 20 carbon atoms, p is an integer of 1 to 5 such that when p is no less than 2, a plurality of R3s is identical or different, and at least one of L3 and at least one R3 bonds to M via a carbon atom that bonds to the metal atom by a covalent bond and does not constitute an unsaturated bond.
Dependencies are inferred from the claim text.