# US 11,079,543 B1 · Isotropic etchback method of linewidth tailoring multilayer dielectric diffraction gratings for improvement of laser damage resistance and diffraction efficiency

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- Number: US 11,079,543 B1
- Document ID: US11079543B1
- Status: Granted
- Kind: B1
- Application number: 13/244,033
- Filed: 2011-09-23
- Granted: 2021-08-03
- Earliest claimed: 2010-09-23
- Assignees: Lawrence Livermore National Security, LLC
- Applicants: Jerald A. Britten; Cindy C. Larson; Hoang T. Nguyen
- Inventors: Jerald A. Britten; Cindy C. Larson; Hoang T. Nguyen
- Web page: https://patentgrep.com/patent/US11079543B1

## CPC

- G02B 6/124: Geodesic lenses or integrated gratings
- G02B 6/136: by etching
- G02B 6/13: Integrated optical circuits characterised by the manufacturing method
- H01S 3/0057: {Temporal shaping, e.g. pulse compression, frequency chirping (soliton generation and propagation G02F1/3513, H01S3/063 and H01S3/108)}
- G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- H01S: DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL

## Abstract

A method of fabricating a multilayer dielectric (MLD) diffraction grating by providing a multilayer stack having a grating layer, and anisotropically etching the grating layer to form grating lines having an initial lineheight, an initial linewidth, and an initial grating duty cycle, that are greater than a target lineheight, a target linewidth, and a target grating duty cycle, respectively. An isotropic wet etch solution is then used to etch back the grating lines to the target lineheight, the target linewidth, and the target grating duty cycle so as to minimize electric field intensities and maximize diffraction efficiency for a given set of MLD illumination conditions.

## Claims

### Claim 1

A method of fabricating a multilayer dielectric (MLD) diffraction grating, comprising:
providing a multilayer stack having a grating layer;
determining a target lineheight, a target linewidth, and a target grating duty cycle of the MLD diffraction grating to be fabricated;
selecting an initial lineheight, an initial linewidth, and an initial grating duty cycle, that are greater than the target lineheight, the target linewidth, and the target grating duty cycle, respectively;
anisotropically etching the grating layer to form grating lines having the selected initial lineheight, the initial linewidth, and the initial grating duty cycle; and
using an isotropic wet etch solution to etch back the grating lines to the target lineheight, the target linewidth, and the target grating duty cycle.

### Claim 2 (depends on 1)

The method of claim 1, further comprising:
determining for a predetermined set of grating illumination parameters an optimized grating profile including an optimum lineheight, optimum grating duty cycle, and optimum linewidth, that is optimized for minimal electric field intensities in the grating layer material and maximum diffraction efficiency; and
selecting the optimum lineheight, optimum grating duty cycle, and optimum linewidth of the optimized grating profile for the target lineheight, target linewidth, and target grating duty cycle, respectively.

### Claim 3 (depends on 1)

The method of claim 1,
wherein the anisotropically etching step is by ion milling.

### Claim 4 (depends on 1)

The method of claim 1,
wherein the isotropic wet etch solution is a hydrofluoric (HF) acid solution.

### Claim 5 (depends on 4)

The method of claim 4,
wherein the HF acid solution is diluted and buffered.

### Claim 6

A method of fabricating a multilayer dielectric (MLD) diffraction grating, comprising:
providing a multilayer stack having a grating layer;
determining for a predetermined set of grating illumination parameters an optimized grating profile including an optimum lineheight, optimum grating duty cycle, and optimum linewidth, that is optimized for minimal electric field intensities in the grating layer material and maximum diffraction efficiency;
selecting an initial lineheight, an initial linewidth, and an initial grating duty cycle, that are greater than the optimum lineheight, the optimum linewidth, and the optimum grating duty cycle, respectively;
anisotropically etching the grating layer to form grating lines having the initial lineheight, the initial linewidth, and the initial grating duty cycle; and
using hydrofluoric (HF) acid solution to isotropically etch back the grating lines to the optimum lineheight, optimum grating duty cycle, and optimum linewidth of the optimized grating profile.