# US 11,079,476 B2 · Light-receiving element and distance measurement module

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- Number: US 11,079,476 B2
- Document ID: US11079476B2
- Status: Granted
- Kind: B2
- Application number: 16/504,875
- Filed: 2019-07-08
- Published: 2020-01-23
- Granted: 2021-08-03
- Earliest claimed: 2018-07-18
- Assignees: Sony Semiconductor Solutions Corporation
- Applicants: Sony Semiconductor Solutions Corporation
- Inventors: Tsutomu Imoto; Yuji Isogai; Takuya Maruyama; Takuro Murase; Ryota Watanabe; Takeshi Yamazaki
- Web page: https://patentgrep.com/patent/US11079476B2

## CPC

- G01S 7/4816: {of receivers alone}
- G01S 17/32: using transmission of continuous waves, whether amplitude-, frequency-, or phase-modulated, or unmodulated
- G01S 17/89: for mapping or imaging
- H10F 30/21: the devices being sensitive to infrared, visible or ultraviolet radiation
- H10F 39/802: {Geometry or disposition of elements in pixels, e.g. address-lines or gate electrodes}
- H10F 39/8033: {Photosensitive area}
- H10F 77/206: {for devices having potential barriers}
- H10F 77/413: {directly associated or integrated with the devices, e.g. back reflectors (directly associated or integrated with photovoltaic cells H10F77/42)}
- H10F 77/93: {Interconnections}
- H10F 77/957: {for position-sensitive photodetectors, e.g. lateral-effect photodiodes or quadrant photodiodes}
- G01S 15/08: Systems for measuring distance only (indirect measurement G01S15/46)
- H10F 39/8057: {Optical shielding}
- H10F 39/8063: {Microlenses}
- G01S: RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
- H10F: INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION

## Abstract

A light-receiving element includes an on-chip lens; an interconnection layer; and a semiconductor layer that is disposed between the on-chip lens and the interconnection layer. The semiconductor layer includes a first voltage application unit to which a first voltage is applied, a second voltage application unit to which a second voltage different from the first voltage is applied, a first charge detection unit that is disposed at the periphery of the first voltage application unit, a second charge detection unit that is disposed at the periphery of the second voltage application unit, and a charge discharge region that is provided on an outer side of an effective pixel region. For example, the present technology is applicable to a light-receiving element that generates distance information in a ToF method, or the like.

## Claims

### Claim 1

A light-receiving element, comprising:
an on-chip lens;
an interconnection layer; and
a semiconductor layer that is disposed between the on-chip lens and the interconnection layer, wherein the semiconductor layer includes:
a first voltage application unit to which a first voltage is applied;
a second voltage application unit to which a second voltage different from the first voltage is applied;
a first charge detection unit that is disposed at a periphery of the first voltage application unit;
a second charge detection unit that is disposed at a periphery of the second voltage application unit; and
a charge discharge region that is provided on an outer side of an effective pixel region, wherein the charge discharge region includes a light-shielding pixel that is driven.

### Claim 2 (depends on 1)

The light-receiving element according to claim 1, wherein
the interconnection layer includes at least one layer including a reflection member, and
the reflection member is provided to overlap the first charge detection unit or the second charge detection unit in a plan view.

### Claim 3 (depends on 1)

The light-receiving element according to claim 1, wherein
the interconnection layer includes at least one layer including a light-shielding member, and
the light-shielding member is provided to overlap the first charge detection unit or the second charge detection unit in a plan view.

### Claim 4 (depends on 1)

The light-receiving element according to claim 1, wherein
the charge discharge region includes an opening pixel that is driven.

### Claim 5 (depends on 1)

The light-receiving element according to claim 1, wherein
the charge discharge region includes a high-concentration N-type region to which a zero or positive voltage is applied.

### Claim 6 (depends on 1)

The light-receiving element according to claim 1, further comprising
a P-well region, which is in contact with an insulating film at the periphery of the first and second charge detection units, at a boundary portion of pixels.

### Claim 7 (depends on 6)

The light-receiving element according to claim 6, wherein
the P-well region has an impurity concentration higher than an impurity concentration of a photoelectric conversion region.

### Claim 8 (depends on 1)

The light-receiving element according to claim 1, further comprising
an N-type diffusion layer, to which a zero or positive voltage is applied, in a gap region between a P-well region in which a pixel transistor is formed and an insulating film at the periphery of the first and second charge detection units.

### Claim 9 (depends on 8)

The light-receiving element according to claim 8, wherein
the N-type diffusion layer is disposed to be shared by a pixel column inside the effective pixel region.

### Claim 10 (depends on 8)

The light-receiving element according to claim 8, wherein
the N-type diffusion layer is disposed in a pixel outside the effective pixel region.

### Claim 11 (depends on 8)

The light-receiving element according to claim 8, wherein
the N-type diffusion layer is disposed in each pixel inside the effective pixel region.

### Claim 12 (depends on 1)

The light-receiving element according to claim 1, wherein
the first and second voltage application units are constituted by first and second P-type semiconductor regions each formed in the semiconductor layer.

### Claim 13 (depends on 1)

The light-receiving element according to claim 1, wherein
the first and second voltage application units are constituted by first and second transfer transistors each formed in the semiconductor layer.

### Claim 14

A distance measurement module, comprising:
a light-receiving element including an on-chip lens, an interconnection layer, and a semiconductor layer that is disposed between the on-chip lens and the interconnection layer, the semiconductor layer including a first voltage application unit to which a first voltage is applied, a second voltage application unit to which a second voltage different from the first voltage is applied, a first charge detection unit that is disposed at a periphery of the first voltage application unit, a second charge detection unit that is disposed at a periphery of the second voltage application unit, and a charge discharge region that is provided on an outer side of an effective pixel region, wherein the charge discharge region includes a light-shielding pixel that is driven;
a light source that emits irradiation light of which brightness periodically fluctuates; and
a light-emission control unit that controls an irradiation timing of the irradiation light.
