# US 11,079,411 B2 · Electromechanical component, electromechanical component arrangement, method of detecting a potential difference by using an electromechanical component, and method for performing a functional test on the electromechanical component > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,079,411 B2 - Document ID: US11079411B2 - Status: Granted - Kind: B2 - Application number: 16/159,552 - Filed: 2018-10-12 - Published: 2019-03-21 - Granted: 2021-08-03 - Earliest claimed: 2016-04-13 - Assignees: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. - Applicants: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. - Inventors: Linus Elsäber; Matthias Schulze; Martin Friedrichs; Christoph Hohle; Detlef Kunze - Web page: https://patentgrep.com/patent/US11079411B2 ## CPC - G01R 15/165: {measuring electrostatic potential, e.g. with electrostatic voltmeters or electrometers, when the design of the sensor is essential (electrometers with passively moving electrodes G01R5/28; measuring electrostatic fields G01R29/12; measuring charge G01R29/24; measuring in circuits with high internal resistance G01R19/0023)} - G01R 29/12: Measuring electrostatic fields {or voltage-potential} - G01R 35/00: Testing or calibrating of apparatus covered by the other groups of this subclass - G01R: MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES (indicating correct tuning of resonant circuits H03J3/12) ## Abstract An electromechanical component and an electromechanical component arrangement for proving the existence of a potential difference which consists of a first electrode, a second electrode and a proving structure. The proving structure is configured to be deflected in the event of there being a potential difference. In addition, an electromechanical component is configured to generate a useful effect. A method implements operation of an electromechanical component for proving the existence of a potential difference, other methods implement operation for performing a functional test on the electromechanical component. ## Claims ### Claim 1 An electromechanical component for deflecting a particle beam, comprising: a first electrode; a second electrode; an elastically deformable proving structure; and a substrate; wherein the first electrode and the second electrode are located opposite one another at a distance; wherein the substrate comprises an opening in a region between the first electrode and the second electrode; wherein the first electrode and the second electrode are arranged to generate an electrical field in the event of there being a potential difference between the first electrode and the second electrode; and wherein the opening is configured to enable passage of the particle beam through the electromechanical component; wherein the first electrode and the second electrode are configured such that the electrical field is suited to influence the particle beam; wherein the elastically deformable proving structure is configured to be deflected in the event of there being a potential difference between the first electrode and the second electrode; wherein the opening is configured such that the particle beam passes through the opening along a first trajectory at a first operational potential difference, and wherein the electromechanical component is configured such that the particle beam extends along a second trajectory at a second operational potential difference. ### Claim 2 (depends on 1) The electromechanical component as claimed in claim 1, wherein the elastically deformable proving structure comprises a base surface; and wherein the elastically deformable proving structure comprises a further surface, which is essentially perpendicular to the base surface; and wherein the elastically deformable proving structure comprises an upper face, which is essentially in parallel with the base surface. ### Claim 3 (depends on 1) The electromechanical component as claimed in claim 1, wherein the elastically deformable proving structure comprises at least one region comprising an elastic material. ### Claim 4 (depends on 1) The electromechanical component as claimed in claim 1, wherein the elastically deformable proving structure comprises at least one region made of titanium or of aluminum or of titanium-aluminum or of aluminum-silicon-titanium. ### Claim 5 (depends on 1) The electromechanical component as claimed in claim 1, wherein the elastically deformable proving structure overlaps the first electrode such that a region of the elastically deformable proving structure, which is spaced apart from a mechanical attachment region of the elastically deformable proving structure, is located opposite a region of the first electrode. ### Claim 6 (depends on 1) The electromechanical component as claimed in claim 1, wherein the elastically deformable proving structure comprises a deflection facilitation structure facilitating the deflection of the elastically deformable proving structure and/or reducing the bending strength of the elastically deformable proving structure. ### Claim 7 (depends on 6) The electromechanical component as claimed in claim 6, wherein the deflection facilitation structure is configured such that the elastically deformable proving structure achieves a shielding effect on the field emanating from the first electrode; and wherein the deflection facilitation structure is configured to facilitate the deflection of the elastically deformable proving structure as compared to a elastically deformable proving structure which does not comprise the deflection facilitation structure. ### Claim 8 (depends on 6) The electromechanical component as claimed in claim 6, wherein the elastically deformable proving structure comprises at least two slits; and wherein the elastically deformable proving structure comprises a free end; and wherein a first slit of extends from the free end of the elastically deformable proving structure to an inner region of the elastically deformable proving structure; and wherein a second slit extends from the free end of the elastically deformable proving structure to an inner region of the elastically deformable proving structure; and wherein the first slit and the second slit are provided at a mutual distance. ### Claim 9 (depends on 6) The electromechanical component as claimed in claim 6, wherein the elastically deformable proving structure comprises at least three slits; and wherein the elastically deformable proving structure comprises a free end; and wherein a first slit extends, in a first portion of the first slit, from the free end of the elastically deformable proving structure to an inner region of the elastically deformable proving structure, and, following this, extends, within the inner region of the elastically deformable proving structure, in a second portion of the first slit; and wherein a second slit extends, in a first portion of the second slit, from the free end of the elastically deformable proving structure to the inner region of the elastically deformable proving structure, and, following this, extends, within the inner region of the elastically deformable proving structure, in a second portion of the second slit; and wherein a third slit extends within the inner region of the elastically deformable proving structure, said third slit being adjacent to the second portion of the first slit and to the second portion of the second slit; and wherein the second portion of the first slit extends, within a region adjacent to a first portion of the third slit, essentially in parallel with the first portion of the third slit; and wherein the second portion of the second slit extends, within a region adjacent to a second portion of the third slit, essentially in parallel with the second portion of the third slit; and wherein the first portion of the third slit merges into the second portion of the third slit. ### Claim 10 (depends on 1) The electromechanical component as claimed in claim 1, wherein the elastically deformable proving structure is configured to achieve a shielding effect on a field emanating from the first electrode. ### Claim 11 (depends on 1) The electromechanical component as claimed in claim 1, wherein the first electrode is arranged on a substrate, and wherein the elastically deformable proving structure overlaps the first electrode such that the first electrode is located at least partly between the elastically deformable proving structure and the substrate so as to achieve a shielding effect on the field emanating from the first electrode. ### Claim 12 (depends on 1) The electromechanical component as claimed in claim 1, wherein the elastically deformable proving structure comprises several portions located opposite several lateral surfaces of the first electrode so as to shield the electrode off toward several directions. ### Claim 13 (depends on 1) The electromechanical component as claimed in claim 1, wherein the first electrode and/or the second electrode are raised as compared to a main surface of the substrate. ### Claim 14 (depends on 1) The electromechanical component as claimed in claim 1, wherein the second electrode is higher, in relation to a main surface of the substrate, than the first electrode. ### Claim 15 (depends on 1) The electromechanical component as claimed in claim 1, wherein the first electrode and the second electrode are located opposite each other. ### Claim 16 (depends on 1) The electromechanical component as claimed in claim 1, wherein the first electrode and the second electrode are configured such that the electrical field is suited to influence at least one mechanical structure; and wherein the mechanical structure differs from the elastically deformable proving structure. ### Claim 17 (depends on 1) The electromechanical component as claimed in claim 1, wherein the first electrode and the second electrode are configured such that the electrical field is suited to influence electromagnetic radiation and/or individual photons. ### Claim 18 (depends on 1) The electromechanical component as claimed in claim 1, wherein the first electrode and the second electrode are configured such that the electrical field is suited to deflect or to influence a particle beam of charged particles. ### Claim 19 (depends on 1) The electromechanical component as claimed in claim 1, wherein the second electrode and the elastically deformable proving structure are electrically coupled to a reference potential supply of a circuit; and wherein the first electrode is configured to comprise a potential different from the reference potential of the circuit. ### Claim 20 (depends on 1) An electromechanical component arrangement, said electromechanical component arrangement comprising a plurality of electromechanical components as claimed in claim 1. ### Claim 21 (depends on 20) The electromechanical component arrangement as claimed in claim 20, wherein the electromechanical components are arranged on a substrate; and wherein the electromechanical components are arranged in both spatial directions of the surface of the substrate. ### Claim 22 (depends on 20) The electromechanical component arrangement as claimed in claim 20, said electromechanical component arrangement comprising a row and/or column structure; and wherein a respective row and/or a respective column comprises a plurality of electromechanical components. ### Claim 23 (depends on 20) The electromechanical component arrangement as claimed in claim 20, said electromechanical component arrangement comprising at least two electromechanical components; and wherein a first electromechanical component comprises a first electrode and a second electrode and an elastically deformable elastically deformable proving structure; wherein the first electrode of the first electromechanical component and the second electrode of the first electromechanical component are arranged to generate a first electrical field in the event of there being a potential difference between the first electrode of the first electromechanical component and the second electrode of the first electromechanical component; and wherein the elastically deformable proving structure of the first electromechanical component is configured to be deflected in the event of there being a potential difference between the first electrode of the first electromechanical component and the second electrode of the first electromechanical component; and wherein a second electromechanical component comprises a first electrode and a second electrode and an elastically deformable elastically deformable proving structure; wherein the first electrode of the second electromechanical component and the second electrode of the second electromechanical component are arranged to generate a second electrical field in the event of there being a potential difference between the first electrode of the second electromechanical component and the second electrode of the second electromechanical component; and wherein the elastically deformable proving structure of the second electromechanical component is configured to be deflected in the event of there being the potential difference between the first electrode of the second electromechanical component and the second electrode of the second electromechanical component; and wherein the second electrode of the first electromechanical component is provided adjacently to the first electrode of the second electromechanical component. ### Claim 24 (depends on 23) The electromechanical component arrangement as claimed in claim 23, wherein the elastically deformable proving structure of the second electromechanical component is provided on the second electrode of the first electromechanical component. ### Claim 25 (depends on 23) The electromechanical component arrangement as claimed in claim 23, wherein the second electrode of the first electromechanical component is manufactured such that each of three sides of the first electrode of the second electromechanical component comprises one side of the second electrode of the first electromechanical component located opposite it. ### Claim 26 (depends on 23) The electromechanical component arrangement as claimed in claim 23, wherein the elastically deformable proving structure of the second electromechanical component is provided on the second electrode of the first electromechanical component; and wherein the first electrode of the second electromechanical component is located at least partly between the elastically deformable proving structure of the second electromechanical component and the substrate. ### Claim 27 (depends on 1) A method of performing a functional test on an electromechanical component as claimed in claim 1, the method comprising: controlling the electromechanical component such that with a functional component, a potential difference arises between the first and the second electrodes which is suited to generate the electrical field; and detecting a deflection of the elastically deformable proving structure; and deciding, as a function of the detection of the deflection, whether or not the electromechanical component is functional. ### Claim 28 (depends on 27) The method as claimed in claim 27, wherein the decision is made irrespectively of the deflection of the particle beam. ### Claim 29 (depends on 27) The method as claimed in claim 27, wherein the deflection of the elastically deformable proving structure is detected optically and/or electrically. ### Claim 30 (depends on 27) The method as claimed in claim 27, wherein the deflection of the elastically deformable proving structure is detected by means of a white-light interferometer or of a light microscope. ### Claim 31 (depends on 27) The method as claimed in claim 27, wherein the deflection of the elastically deformable proving structure that is due to the potential difference between the first electrode and the second electrode is at least 3 nm, advantageously at least 5 nm, most advantageously at least 20 nm. ### Claim 32 (depends on 27) The method as claimed in claim 27, wherein, at a potential difference between the first electrode and the second electrode of up to 50 V, advantageously up to 10 V, the deflection of the elastically deformable proving structure will be within a pre-defined range. ### Claim 33 (depends on 27) The method as claimed in claim 27, wherein the potential difference between the first electrode and the second electrode changes by a maximum of 50 V during operation. ### Claim 34 (depends on 27) The method as claimed in claim 27, wherein the deflection of the elastically deformable proving structure is detected optically and/or electrically.