Method and apparatus for obtaining matching process results among multiple reaction chambers
AssigneeBeijing Naura Microelectronics Equipment Co., Ltd.
InventorsJihong Zhang, Jinsheng Fu
Life of this patent
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Abstract
A matching method for multiple reaction chambers includes selecting at least one factor, setting an adjustment coefficient for the factor corresponding to each of the reaction chambers, and obtaining an input value of the factor to enter into each reaction chamber based on the target value of the factor and the adjustment coefficient corresponding to each of the reaction chambers. The processing factor has a target value and a real value corresponding to each of the reaction chamber. The adjustment coefficient is based on the real value and the target value of the factor being within a preset accuracy range when the corresponding chamber operates a process.
Claims16
A matching method for multiple reaction chambers, comprising:
- selecting at least one processing factor;
- applying a target value of the at least one processing factor to each of the reaction chambers and detecting a real value of the at least one processing factor of a corresponding reaction chamber in response to the target value being input to the corresponding reaction chamber, the target value being set identical for the at least one processing factor of the reaction chambers;
- applying a fitting method based on the real value and the target value to obtain an adjustment coefficient of the at least one processing factor for each of the reaction chambers, the adjustment coefficient being determined based on a difference between the real value and the target value of the at least one processing factor within a preset accuracy range;
- and
- obtaining an input value of the at least one processing factor to enter into each of the reaction chambers based on a product of the target value and the adjustment coefficient corresponding to each of the reaction chambers.
A matching apparatus for multiple reaction chambers, comprising:
- a selection device, configured to select at least one processing factor;
- a setting device, configured to:
- apply a target value of the at least one processing factor to each of the reaction chambers and detect a real value of the at least one processing factor of a corresponding reaction chamber in response to the target value being input to the corresponding reaction chamber, the target value being set identical for the at least one processing factor of the reaction chambers;
- and
- apply a fitting method based on the real value and the target value to obtain an adjustment coefficient for the at least one processing factor for each of the reaction chambers, the adjustment coefficient being determined based on a difference between the real value and the target value of the at least one processing factor within a preset accuracy range;
- and
- a matching device, configured to obtain an input value of the at least one processing factor to enter into each of the reaction chambers based on a product of the target value and the adjustment coefficient corresponding to each of the reaction chambers.
Dependencies are inferred from the claim text.