Substrate holding apparatus

A substrate holding apparatus, comprising:

• a baseplate;
• an adhesive layer disposed on the baseplate;
• and
• an electrostatic chuck disposed on the adhesive layer to hold an object,
• wherein a first lateral surface of a first portion of the electrostatic chuck is at a same position in a plan view as a second lateral surface of a second portion of the baseplate, the first portion being in contact with a first face of the adhesive layer, the second portion being in contact with a second face of the adhesive layer,
• wherein an outer perimeter portion of the adhesive layer extends outwardly from the first lateral surface and the second lateral surface, such that the first face of the adhesive layer is partially in contact with the electrostatic chuck and partially exposed beyond the first lateral surface without being in contact with the electrostatic chuck, and the second face of the adhesive layer is partially in contact with the baseplate and partially exposed beyond the second lateral surface without being in contact with the baseplate, and
• wherein the first face and the second face of the adhesive layer are flat planes extending from an inside of the first lateral surface and the second lateral surface to an outside of the first lateral surface and the second lateral surface.