Apparatus and system having extraction assembly for wide angle ion beam
AssigneeApplied Materials, Inc.
InventorsCostel Biloiu, Appu Naveen Thomas, Tyler Rockwell, Frank Sinclair, Christopher Campbell
Life of this patent
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Abstract
An ion beam processing apparatus may include a plasma chamber, and a plasma plate, disposed alongside the plasma chamber, where the plasma plate defines a first extraction aperture. The apparatus may include a beam blocker, disposed within the plasma chamber and facing the extraction aperture. The apparatus may further include a non-planar electrode, disposed adjacent the beam blocker and outside of the plasma chamber; and an extraction plate, disposed outside the plasma plate, and defining a second extraction aperture, aligned with the first extraction aperture.
Claims17
An ion beam processing apparatus comprising:
- a plasma chamber;
- a plasma plate, disposed alongside the plasma chamber, the plasma plate defining a first extraction aperture;
- a beam blocker, disposed within the plasma chamber and facing the extraction aperture;
- a non-planar electrode, disposed adjacent the beam blocker and outside of the plasma chamber;
- an extraction plate, disposed outside the plasma plate, and defining a second extraction aperture, aligned with the first extraction aperture;
- and
- an extraction voltage supply, being electrically coupled to bias the extraction plate, the non-planar electrode, and the substrate at a same voltage with respect to the plasma chamber.
An ion beam processing system comprising:
- a plasma chamber;
- an extraction assembly, disposed along a side of the plasma chamber, comprising:
- a plasma plate, disposed alongside the plasma chamber, the plasma plate defining a first extraction aperture;
- a beam blocker, disposed within the plasma chamber and facing the extraction aperture;
- a non-planar electrode, disposed adjacent the beam blocker and outside of the plasma chamber;
- and
- an extraction plate, disposed outside the plasma plate, and defining a second extraction aperture, aligned with the first extraction aperture;
- and
- an extraction voltage system, electrically coupled to the plasma chamber and the extraction plate to generate a bias voltage between the extraction plate and the plasma chamber, the extraction voltage system being electrically coupled to bias the extraction plate, the non-planar electrode, and the substrate at a same voltage with respect to the plasma chamber.
Dependencies are inferred from the claim text.