US 11,056,316 B2 · Radio frequency pulse matching method and device thereof and pulsing plasma generation system

Abstract

A radio frequency (RF) pulse matching method includes presetting a matching threshold and initializing a pulse count value to a pulse reference value and loading pulse power to an upper electrode and a lower electrode. The upper electrode includes an upper RF power supply and a corresponding upper matching device. The lower electrode includes a lower RF power supply and a corresponding lower matching device. The method further includes collecting a pulse signal of the pulse power and calculating a matching parameter according to the pulse signal, determining a magnitude of the matching parameter relative to the matching threshold and resetting the pulse count value, causing the upper matching device to perform matching on the upper RF power supply or the lower matching device to perform matching on the lower RF power supply, and repeating processes until the upper RF power supply and the lower RF power supply are matched.

Claims16

Dependent claims

A radio frequency (RF) pulse matching method, comprising:

presetting a matching threshold and initializing a pulse count value to a pulse reference value;
loading pulse power to an upper electrode and a lower electrode, the upper electrode including an upper RF power supply and a corresponding upper matching device, and the lower electrode including a lower RF power supply and a corresponding lower matching device;
collecting a pulse signal of the pulse power loaded by the upper RF power supply and calculating a matching parameter of the upper matching device according to the pulse signal;
determining a magnitude of the matching parameter relative to the matching threshold and resetting the pulse count value;
causing of the upper matching device to perform matching on the upper RF power supply or the lower matching device to perform matching on the lower RF power supply according to consistency of the reset pulse count value and the pulse reference value;
and
repeating processes until the upper RF power supply and the lower RF power supply are matched.

4 more elements

An RF pulse device, comprising:

an upper electrode including an upper RF power supply and a corresponding upper matching device;
a lower electrode including a lower RF power supply and a corresponding lower matching device;
a pulsing synchronization line connecting between the upper RF power supply and the lower RF power supply;
and
a pulse matching time sequence control line and a time sequence matching circuit being arranged between the upper matching device and the lower matching device, the time matching circuit including:
a pre-processing circuit configured to preset a matching threshold and initialize a pulse count value to a pulse reference value;
a loading circuit configured to collect a pulse signal of pulse power loaded by the upper RF power supply and calculate a matching parameter of the upper matching device according to the pulse signal;
a determination circuit configured to determine a magnitude of the matching parameter relative to the matching threshold and reset the pulse count value according to the magnitude of the matching parameter relative to the matching threshold;
and
a matching circuit configured to cause the upper matching device to perform matching on the upper RF power supply or cause the lower matching device to perform the matching on the lower RF power supply according to consistency of the reset pulse count value and the pulse reference value.

7 more elements

A pulse plasma generation system comprising an RF pulse device including:

an upper electrode including an upper RF power supply and a corresponding upper matching device;
a lower electrode including a lower RF power supply and a corresponding lower matching device;
a pulsing synchronization line connecting between the upper RF power supply and the lower RF power supply;
and
a pulse matching time sequence control line and a time sequence matching circuit being arranged between the upper matching device and the lower matching device, the time matching circuit including:
a pre-processing circuit configured to preset a matching threshold and initialize a pulse count value to a pulse reference value;
a loading circuit configured to collect a pulse signal of pulse power loaded by the upper RF power supply and calculate a matching parameter of the upper matching device according to the pulse signal;
a determination circuit configured to determine a magnitude of the matching parameter relative to the matching threshold and reset the pulse count value according to the magnitude of the matching parameter relative to the matching threshold;
and
a matching circuit configured to cause the upper matching device to perform matching on the upper RF power supply or cause the lower matching device to perform the matching on the lower RF power supply according to consistency of the reset pulse count value and the pulse reference value.

7 more elements

Dependencies are inferred from the claim text.

Radio frequency pulse matching method and device thereof and pulsing plasma generation system

Life of this patent

Radio frequency pulse matching method and device thereof and pulsing plasma generation system

Life of this patent

Abstract

Claims16